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Laser-nanoprinting-enabled multilevel nanoscale phase encoding on quartz for integrated optical diffractive devices
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DOI：10.37188/lam.2026.031.png)
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Abstract
En 中文
To overcome the resolution and stability limitations of conventional grayscale lithography, we present a lasernanoprinting-assisted technique for multilevel nanoscale phase encoding on a quartz substrate. The proposed approach combines femtosecond laser-based grayscale mask fabrication with multiparameter dry etching optimisation to achieve precise phase modulation with subwavelength resolution approximately 81 nm) and pixel sizes as small as 1 mu m2. Up to eight discrete phase levels are supported, enabling efficient diffraction control and device-level functionality. Using this method, various integrated diffractive devices, including lenses, holograms, and diffractive neural networks (DNNs), were realised on quartz substrates. The fabricated structures exhibit high pattern fidelity, mechanical and chemical robustness, and compatibility with standard photonic integration platforms. Notably, a single-layer quartz-based DNN achieved a classification accuracy of 91.75% across four classes of handwritten digits. This nanoprinting-enabled strategy provides a scalable and stable pathway for fabricating compact, multifunctional, and high-resolution diffractive photonic devices.
Keywords:
Laser-nanoprinting
Grayscale lithography
Dry etching
Diffractive elements
Diffractive neural networks
Journal
L
IF:
10.6
Papers:
15
Citations:
1.5K