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Macroscale smoothing mechanism in plasma polishing of polycrystalline diamond: diffusion-controlled etching
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DOI：10.1016/j.jmatprotec.2026.119328.png)
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Abstract
En 中文
• Plasma polishing consists of macroscale smoothing and microscale smoothing effects. • The macro-smoothing effect is attributed to diffusion-controlled etching. • Reaction enhancement by excited argon in the plasma is critical for macro-smoothing. • Diffusion-controlled etching is identified in a gas-solid polishing process. • The revealed mechanism lays a theoretical foundation for process improvement.
Keywords:
plasma polishing
macroscale smoothing
diffusion-controlled etching
polycrystalline diamond
argon excitation
Journal
J
IF:
7.5
Papers:
1.6W
Citations:
4.5W
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Cited Papers