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Mechanisms of reactive medium-assisted laser ablation of thermally active materials: a case study of hydrochloric film-assisted laser machining of microchannel arrays on AlN
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DOI：10.1016/j.ijmachtools.2026.104388.png)
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Abstract
En 中文
• Proposed Hydrochloric Film Assisted Laser Processing (HFALP) for efficient, high-quality machining of AlN. • Revealed the intrinsic relationship between cavitation bubble dynamics and laser-liquid layer interactions. • Elucidated two material removal mechanisms—tunnel channel ablation and cavitation ablation—induced by multi-mechanism synergy in the "laser-active medium-thermally active material" ternary system. • Successfully fabricated microchannel arrays on AlN by coupling the dual mechanisms, providing a transferable technical pathway for efficient, high-quality processing of other thermally active materials.
Keywords:
Hydrochloric Film Assisted Laser Processing
Cavitation Bubble Dynamics
Material Removal Mechanisms
Microchannel Arrays
AlN Machining
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