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Methodological Framework for Semiconductor Fab Design Using Dynamo-Based Generative Design
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DOI：10.3390/app152011032.png)
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Abstract
En 中文
The rapid growth of the semiconductor industry has created a bottleneck in which traditional manual methods for designing fabrication plants (fabs) cannot keep pace with their high complexity and short technological lifecycles. This problem stems from the critical mismatch between a fab's multiyear construction timeline and the rapidly shrinking lifecycle of the advanced chips it is built to produce. To address this challenge, the present study proposes a methodological framework that uses dynamic generative design within a Building Information Modelling (BIM) environment. This approach applies algorithms to generalized models to generate and evaluate numerous potential design solutions automatically. For facility layouts, the framework produces plans that balance spatial efficiency, material flow, and stringent cleanroom protocols. For complex utility systems, it moves beyond simple clash detection to proactively generate resource-efficient, clash-free routing paths that consider both constructability and long-term maintainability. The primary contribution of this study is a standardized, data-agnostic design process that enhances design quality without requiring sensitive project data, establishing a robust foundation for future Digital Twin integration.
Keywords:
generative design
design automation
semiconductor fab
BIM (building information modeling)
dynamo
Journal
A
IF:
2.5
Papers:
7.3K
Citations:
4