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Micro and nano dual-scale structures fabricated by amplitude modulation in multi-beam laser interference lithography
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DOI：10.1364/OE.25.029135.png)
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Abstract
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In this work, an effective method was presented to obtain a specific micro and nano dual-structures by amplitude modulation in multi-beam laser interference lithography (LIL). Moire effect was applied to generate the amplitude modulation. The specific intensity modulation patterns can be obtained by the control of the parameter settings of incident laser beams. Both the incident angle and azimuth angle asymmetric configurations can cause the amplitude modulation in the interference optic field and the modulation period is determined by the angle offset. A four-beam LIL system was set up to fabricate patterns on photoresist and verify the method. The experimental results are in good agreement with the theoretical analysis. (C) 2017 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
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