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Multi-phase-field framework for multi-material topology optimization
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DOI：10.1016/j.commatsci.2024.113201.png)
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Abstract
En 中文
The rise of multi-material additive manufacturing (AM) technology has heightened the need for effective multimaterial topology optimization techniques. In this study, we devised a multi-phase-field (MPF) framework tailored for multi-material topology optimization. Within this framework, we implemented an MPF model with double-obstacle potential, which can define the interface region clearly and restrict the interface migration computation only inside the interface region. By addressing the compliance minimization problem with a constant volume constraint of each material, we confirmed the appropriateness of the developed MPF optimization model in accurately depicting topological changes and material rearrangements, independent on the number of materials involved. Furthermore, our model demonstrates the capability of perimeter control by controlling curvature-driven interface migration. Notably, it allows optimization from flat mixing material conditions, eliminating the need for predefined initial morphologies. This versatility enhances the adaptability and applicability of the developed model in diverse multi-material AM scenarios.
Keywords:
Phase-field method topology optimization
Multi-material
Compliance minimization
Journal
IF:
3.3
Papers:
1.3W
Citations:
3.6W