Near-bulk density and sub-nanometer roughness in gold films achieved by optimized pulsed direct current magnetron sputtering

2026-06-15

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Liqin Yong

Jiarui Liu

Yixiao Hu

Zihang Bai

Xiaofeng Wang

Langping Wang *

DOI：10.1016/j.vacuum.2026.115573

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The fabrication of high-performance X-ray focusing mirrors demands gold films with high density and sub-nanometer surface roughness, while severe residual stress must also be avoided, yet simultaneously achieving these properties remains a challenge. This study demonstrates the optimization of Au films deposited on polished Si(100) substrates via pulsed direct current magnetron sputtering (p-DCMS) to address this goal. We systematically investigated the influence of critical p-DCMS parameters—argon gas pressure, substrate bias voltage, and pulse duty cycle—on film density and surface roughness. By employing the response surface methodology (RSM), the deposition process was optimized. The optimal conditions of a gas pressure of 0.45 Pa, a duty cycle of 7.70%, and a bias voltage of 30 V yielded Au films with a density of 19.25 g/cm3 (close to the theoretical value for gold), an arithmetic average roughness (Ra) of 0.51 nm, and a supplementary tensile residual-stress estimate of 77.06 MPa. These results demonstrate that p-DCMS combined with RSM is effective for balancing density and surface roughness in Au coatings for X-ray optical applications.

Near-bulk density and sub-nanometer roughness in gold films achieved by optimized pulsed direct current magnetron sputtering

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