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Optical Coating Deposition on Submicron-Patterned Surfaces
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DOI：10.3390/coatings15040372.png)
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Abstract
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Periodically modulated optical coatings, fabricated by depositing conformal films on modulated substrates, offer unique capabilities for spectral and spatial filtering of light. However, conventional deposition methods often do not achieve required replication and conformality on submicron-size structured surfaces. In this paper, we compare various thin film deposition techniques, including electron beam evaporation, atomic layer deposition, and ion beam sputtering, to evaluate their ability to control multilayer coating growth on periodically modulated substrates. Our study demonstrates that both single-layer and multilayer coatings produced by ion beam sputtering effectively replicate the initial geometry of structured surfaces, thereby enhancing optical performance.
Keywords:
coatings
gratings
interference lithography
physical vapor deposition
atomic layer deposition
ion beam sputtering
electron beam evaporation
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