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Optimized Barrier Layer Enables High-Performance Bismuth Telluride-based Thermoelectric Devices

delete2026-05-08
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PRE
AI
H
Haowen Chen
K
Kaiyi Luo
P
Pingping Qian
W
Weiyi Liu
Z
Zhengqiang Lu
G
Guang Kun Ren
Y
Yuxi Zhan
Q
Qiang Sun
S
Shengduo Xu *
J
Jun Tang
DOI:10.1016/j.nanoen.2026.112008delete
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Abstract

Abstract

En 中文
• A tailored strategy for optimizing alloy BLs in the bismuth telluride-based TEDs. • High-throughput fabrication and screening of elemental metal BL analogues. • The Ti2.7Al2.3-BL for BTS exhibits excellent thermal, electrical, and mechanical properties. • A high Pmax of 1.10 W and η of 6.02% for the TED integrated with the Ti2.7Al2.3-BL.
Keywords:
Barrier Layer
Bismuth Telluride
Thermoelectric Devices
High-Performance
Alloy Optimization

Journal

Nano Energy cover
Nano Energy
IF:
17.1
Papers:
1.1W
Citations:
13.0W

Organization

U
university of electronic science and technology of china
Scholars:
1.1W
Papers: 4.3K
Citations: 4
T
the hong kong polytechnic university
Scholars:
3.9K
Papers: 2.3K
Citations: 0
C
china academy of engineering physics
Scholars:
806
Papers: 275
Citations: 0
S
sichuan university
Scholars:
11.5W
Papers: 7.6W
Citations: 100
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