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Patterning Complex Line Motifs in Thin Films Using Immersion-Controlled Reaction-Diffusion
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DOI：10.1002/adma.202305191.png)
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Abstract
En 中文
The discovery of self-organization principles that enable scalable routes toward complex functional materials has proven to be a persistent challenge. Here, reaction-diffusion driven, immersion-controlled patterning (R-DIP) is introduced, a self-organization strategy using immersion-controlled reaction-diffusion for targeted line patterning in thin films. By modulating immersion speeds, the movement of a reaction-diffusion front over gel films is controlled, which induces precipitation of highly uniform lines at the reaction front. A balance between the immersion speed and diffusion provides both hands-on tunability of the line spacing (d=10-300 & mu;m$d = 10-300 \; \umu \text{m}$) as well as error-correction against defects. This immersion-driven patterning strategy is widely applicable, which is demonstrated by producing line patterns of silver/silver oxide nanoparticles, silver chromate, silver dichromate, and lead carbonate. Through combinatorial stacking of different line patterns, hybrid materials with multi-dimensional patterns such as square-, diamond-, rectangle-, and triangle-shaped motifs are fabricated. The functionality potential and scalability is demonstrated by producing both wafer-scale diffraction gratings with user-defined features as well as an opto-mechanical sensor based on Moire patterning.
Keywords:
hierarchical materials
Liesegang patterning
Moire patterns
pattern formation
reaction-diffusion
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