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Patterning single-layer materials by electrical breakdown using atomic force microscopy
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DOI：10.1063/10.0023848.png)
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Abstract
En 中文
The development of nanoelectronics and nanotechnologies has been boosted significantly by the emergence of 2D materials because of their atomic thickness and peculiar properties, and developing a universal, precise patterning technology for single-layer 2D materials is critical for assembling nanodevices. Demonstrated here is a nanomachining technique using electrical breakdown by an AFM tip to fabricate nanopores, nanostrips, and other nanostructures on demand. This can be achieved by voltage scanning or applying a constant voltage while moving the tip. By measuring the electrical current, the formation process on single-layer materials was shown quantitatively. The present results provide evidence of successful pattern fabrication on single-layer MoS2, boron nitride, and graphene, although further confirmation is still needed. The proposed method holds promise as a general nanomachining technology for the future.
Keywords:
2D material
Nanopattern
AFM
Electrical breakdown
Lithography
Journal
IF:
2.7
Papers:
288
Citations:
600
Organization
Cited Papers
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