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Photoelectro-selective catalytic flexible polishing of composite materials: active regulation of heterogeneous phase heights
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J
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DOI：10.1016/j.jmatprotec.2026.119334.png)
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Abstract
En 中文
• A photoelectro-selective catalytic flexible polishing method is proposed for phase-selective finishing of RB-SiC. • Synergistic regulation of UV irradiation and voltage enables active control of interphase height difference. • Optimized multi-field conditions enable consistent processing of RB-SiC with improved surface uniformity.
Keywords:
photoelectro-selective catalysis
flexible polishing
phase-selective finishing
heterogeneous phase heights
multi-field regulation
Journal
J
IF:
7.5
Papers:
1.6W
Citations:
4.5W
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