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Photoelectro-selective catalytic flexible polishing of composite materials: active regulation of heterogeneous phase heights

delete2026-05-04
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PRE
AI
C
Caoyang Xue
W
Weijian Zhang
F
Fang Han
W
Wei Gao
J
Jingyuan Wang
W
Wule Zhu *
DOI:10.1016/j.jmatprotec.2026.119334delete
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Abstract

Abstract

En 中文
• A photoelectro-selective catalytic flexible polishing method is proposed for phase-selective finishing of RB-SiC. • Synergistic regulation of UV irradiation and voltage enables active control of interphase height difference. • Optimized multi-field conditions enable consistent processing of RB-SiC with improved surface uniformity.
Keywords:
photoelectro-selective catalysis
flexible polishing
phase-selective finishing
heterogeneous phase heights
multi-field regulation

Journal

J
Journal of Materials Processing Technology
IF:
7.5
Papers:
1.6W
Citations:
4.5W

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