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Photonic-crystal waveguide structure by pattern-integrated interference lithography
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DOI：10.1364/OL.40.002806.png)
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Abstract
En 中文
The pattern-integrated interference lithography (PIIL) technique combines multi-beam interference lithography (MBIL) and imaging to produce functional periodic-lattice-based microstructures in a rapid single-exposure step. A photonic-crystal waveguide structure with submicron resolution is designed, fabricated by PIIL, and characterized. Scanning electron and atomic force microscope images are found to be in good qualitative agreement with three-dimensional simulations of the developed photoresist. (C) 2015 Optical Society of America
Keywords:
HOLOGRAPHIC LITHOGRAPHY
FABRICATION
TEMPLATES
INVERSION
DEFECTS
DEVICES
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