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Plasma technology regulated In3S4 nanosheets surface cationic defects enhanced photocatalytic H2O2 production in pure water
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DOI：10.1016/j.jece.2026.124535.png)
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Abstract
En 中文
• A plasma treatment strategy is developed to construct cationic defects on In3S4. • Surface cationic defects markedly promotes O2 adsorption and activation. • Optimized In3S4-p20 achieves 983.4 μmol g−1 h−1 H2O2 yield in pure water. • Synergistic mechanism between surface defects and hydrophilicity is elucidated.
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7.2
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2.2W
Citations:
8.6W
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Cited Papers