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Plasmonic Lithography Utilizing Epsilon Near Zero Hyperbolic Metamaterial
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DOI：10.1021/acsnano.7b03584.png)
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Abstract
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In this work, a special hyperbolic metamaterial (HMM) metamaterial is investigated for plasmonic lithography of period reduction patterns. It is a type II HMM (is an element of(parallel to) < 0 and is an element of(perpendicular to) > 0) whose tangential component olthe permittivity ell is close to zero. Due to the high anisotropy of the type II epsilon-near-zero (ENZ) HMM, only one plasmonic mode can propagate horizontally with low loss in a waveguide system with ENZ HMM as its core. This work takes the advantage of a type II ENZ HMM composed of aluminum/aluminum oxide films and the associated unusual mode to expose a photoresist layer in a specially designed lithography system. Periodic patterns with a half pitch of 58.3 nm were achieved due to the interference of third-order diffracted light of the grating. The lines were similar to 1/6 of the mask with a period of 700 nm and of the wavelength of the incident light. Moreover, the theoretical analyses performed are widely applicable to structures made of different materials such as silver as well as systems working at deep ultraviolet wavelengths including 193, 248, and 365 nm.
Keywords:
UV lithography
hyperbolic metamaterial
epsilon near zero
nanomanufacturing
spatial filtering
interference
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