arrow
Return

PRISM: three-dimensional sub-diffractive phase-resolved imaging spectroscopic method

delete2024-09-28
delete0
delete
OA
AI
A
A. Dobrowolski *
J
Jakub Jagiełło
B
Beata Pyrzanowska
K
Karolina Piętak
E
Ewelina B. Możdżyńska
T
Tymoteusz Ciuk
DOI:10.1038/s41598-024-72308-zdelete
deleteOriginal
deleteShare
deleteSave
View PDF
Abstract

Abstract

En 中文
We demonstrate a genuine method for three-dimensional pictorial reconstructions of two-dimensional, three-dimensional, and hybrid specimens based on confocal Raman data collected in a back-scattering geometry of a 532-nm setup. The protocol, or the titular PRISM (Phase-Resolved Imaging Spectroscopic Method), allows for sub-diffractive and material-resolved imaging of the object's constituent material phases. The spacial component comes through either the signal distal attenuation ratio (direct mode) or subtle light-matter interactions, including interference enhancement and light absorption (indirect mode). The phase component is brought about by scrutinizing only selected Raman-active modes. We illustrate the PRISM approach in common real-life examples, including photolithographically structured amorphous Al2O3, reactive-ion-etched homoepitaxial SiC, and Chemical Vapor Deposition graphene transferred from copper foil onto a Si substrate and AlGaN microcolumns. The method is implementable in widespread Raman apparatus and offers a leap in the quality of materials imaging. The lateral resolution of PRISM is stage-limited by step motors to 100 nm. At the same time, the vertical accuracy is estimated at a nanometer scale due to the sensitivity of one of the applied phenomena (interference enhancement) to the physical property of the material (layer thickness).
Keywords:
Material-phase-resolved
Imaging method
Spectroscopy
Light
Laser
Optical
Microstructures
Nanostructures
Microcolumns
Graphene
Microtrenches
Light absorption
Signal attenuation
Light scattering
Interference enhancement
Ion etched
Plasma
Atomic layer deposition
Raman spectroscopy
Scanning electron microscopy
Chemical vapor deposition
AI Summary

AI Summary

Key information extracted from the uploaded paper, including a brief overview, abstract, background, key highlights, visual analysis, and future outlook.

Journal

Scientific Reports cover
Scientific Reports
IF:
3.9
Papers:
27.8W
Citations:
83.5W

Organization

W
Warsaw University of Technology
Scholars:
8.3K
Papers: 7.2K
Citations: 5.5K