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Probe-Based 3-D Nano lithography Using Self-Amplified Depolymerization Polymers
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DOI：10.1002/adma.200904386.png)
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Abstract
En 中文
3D patterning by means of probe-assisted thermal decomposition has been achieved on phthalaldehyde polymer films with 1 nm vertical resolution and 40 nm lateral resolution Highly efficient patterning is enabled by a self-amplified depolymerization mechanism. Pixel writing speeds on the order of microseconds are demonstrated
Keywords:
HIGH-SPEED
FABRICATION
SILICON
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26.8
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3.5W
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46.0W
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