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Process optimization and proximity effect correction for gray scale e-beam lithography
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DOI：10.1116/1.2357962.png)
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Abstract
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Three-dimensional microstructures find applications in diffractive optical elements, photonic elements, etc., and can be efficiently fabricated by e-beam lithography. Good process control and efficient proximity effect correction are important for achieving the desired structures. With polymethylmethacrylate as the resist, a process optimization of different develop conditions is carried out to identify a process that is most conductive to gray scale features. A novel proximity effect correction scheme called effective dose-depth (EDD) method is proposed. Using the EDD method for grating design and the optimized process, blazed gratings have been fabricated with excellent uniformity and low surface roughness.
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