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Reactive Deposition of Pt Single-Atoms on g-C3N4: Effect of Pt-Precursors

delete2025-09-29
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OA
AI
N
Nawres Lazaar
S
Shanshan Qin
A
Abdessalem Hamrouni
H
Hinda Lachheb
J
Jan Kolařík
周雪梅 (Xuemei Zhou)
P
Patrik Schmuki
DOI:10.1039/D5NR03212Adelete
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Abstract

Abstract

En 中文
Anchoring Pt single atoms (SAs) as co-catalysts on g-C3N4 has emerged as a promising approach to enhance the hydrogen production performance of this photocatalytic system. Particularly; by so-called reactive deposition; a maximum HER performance can be achieved using a minimum amount of Pt loading. In this study; we explore the effects of different platinum (Pt) precursors on the reactive deposition of single atoms (SAs) onto g-C3N4; aiming to optimize the performance in photocatalytic hydrogen production. By examining a variety of Pt precursor types; we highlight critical parameters influencing deposition; including precursor charge; solution pH; ionic strength; and ligand properties. Our results reveal that precursors bearing anionic charges are distinctly more effective than cationic precursors for depositing highly active Pt single atoms. Crucially; we find that the surface deposition reaction strongly depends on the ligand involved; with chloride-based complexes enabling more efficient Pt attachment compared to bromide-based complexes. Notably; variations in the oxidation state of platinum (Pt4+ versus Pt2+) did not significantly influence deposition outcomes. Among all precursors studied; (NH4)2PtCl6 achieved the highest catalytic activity; with optimal Pt loading (~0.026 wt.%) and superior hydrogen evolution rates surpassing the widely utilized H2PtCl6 precursor. Furthermore; adjustments to solution conditions; such as significant pH changes due to increased ionic strength; were found to negatively impact deposition and catalytic effectiveness. These insights underscore the importance of precursor selection and solution chemistry control; providing a robust basis for the development of efficient and cost-effective single-atom photocatalysts formed by adsorption-reaction treatments.

Journal

Nanoscale cover
Nanoscale
IF:
5.1
Papers:
3.0W
Citations:
11.6W

Organization

No organization information available