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Source mask optimization using the covariance matrix adaptation evolution strategy
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DOI：10.1364/OE.410032.png)
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Abstract
En 中文
Source mask optimization (SMO) is one of the indispensable resolution enhancement techniques to guarantee the image fidelity and process robustness for the 2Xnm technology node and beyond. The optimization capacity and convergence efficiency of SMO are important, especially for full-chip SMO. An SMO method using the covariance matrix adaptation evolution strategy (CMA-ES), together with a new source representation method, is proposed in this paper. Based on the forward vector imaging formulation, the encoding and decoding methods of the source and the mask, and the constructed merit function, the source and the mask are optimized using the CMA-ES algorithm. The solution search space and the search step size are adaptively updated during the optimization procedure. Considering the sparsity of the optimal source, the source is represented by a set of ideal point sources with unit intensity and adjustable positions. The advantageous spatial frequency components of the source for imaging performance improvement are identified through the aggregation of the point sources. Simulations and comparisons verify the superior optimization capacity and convergence efficiency of the proposed method. (C) 2020 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
Keywords:
LITHOGRAPHIC SOURCE
EFFICIENT SOURCE
PIXELATED SOURCE