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Spin-current drift-diffusion transport in common spin-orbit-torque structures

delete2025-04-16
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J. Z. Sun *
DOI:10.1063/5.0269123delete
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Abstract

Abstract

En 中文
We summarize and simplify the drift-diffusion transport of spin-currents in s-band dominant transition metal systems for a few well-studied one dimensional solutions for technology-relevant measurements. They highlight the importance of the spin-current loading effect and interface spin resistance-area products (spin-RAs). Main conclusions from this study are (1) For a nonmagnetic conduction metal, there is a material-specific spin-RA that is defined by ( rho x lambda sf ) , i.e., the resistivity-spin flip diffusion length product. This spin-RA sets the scale for other interface-related spin-RA quantities for effective spin-current transport. (2) Any spin-Hall coefficient ( Theta SH ) measurements needs to have a full spin-conductance analysis to ensure the proper deduction of material specific metrics, such as Theta SH and lambda sf from observations, while including the role of interface spin-RAs. (3) Such interface-related spin-RA consideration exists also for common ferromagnetic transition metal/alloys, which combines spin-flip scattering with that of transverse spin-dephasing (mixing-conductance) related spin-currents and generally making an interface spin-conductance that is non-isotropic against spin-current's polarization direction. Finally, these spin-RAs present a very low impedance environment of the order of 1 m Omega mu m 2 , in contrast with common structures in CMOS technology where RAs are usually above 1 Omega mu m 2 , such as a magnetic tunnel junction in CMOS-integrated magnetic memory. The low impedance nature of spin-current drift-diffusion transport is important to consider for accurate measurements and for technology integration. (c) 2025 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution-NonCommercial-NoDerivs 4.0 International (CC BY-NC-ND) license (https://creativecommons.org/licenses/by-nc-nd/4.0/).https://doi.org/10.1063/5.0269123
Keywords:
MAGNETORESISTANCE

Journal

Journal of Applied Physics cover
Journal of Applied Physics
IF:
2.5
Papers:
2.6K
Citations:
14.5W

Organization

I
IBM TJ Watson Res Ctr
Scholars:
43
Papers: 24
Citations: 19