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Stamp collapse in soft lithography

delete2005-06-29
delete276
PRE
AI
H
Huang, YGY
W
Wei‐Xing Zhou
K
K. Jimmy Hsia
E
Etienne Menard
J
Jang‐Ung Park
J
John A. Rogers
A
Andrew G. Alleyne
DOI:10.1021/la0502185delete
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Abstract

Abstract

En 中文
We have studied the so-called roof collapse in soft lithography. Roof collapse is due to the adhesion between the PDMS stamp and substrate, and it may affect the quality of soft lithography. Our analysis accounts for the interactions of multiple punches and the effect of elastic mismatch between the PDMS stamp and substrate. A scaling law among the stamp modulus, punch height and spacing, and work of adhesion between the stamp and substrate is established. Such a scaling law leads to a simple criterion against the unwanted roof collapse. The present study agrees well with the experimental data.
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Journal

Langmuir cover
Langmuir
IF:
3.9
Papers:
5.4W
Citations:
10.6W

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No organization information available
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