Terbium-based extreme ultraviolet multilayers

doi:10.1364/OL.30.003186

Terbium-based extreme ultraviolet multilayers

2005-12-01

24

OA

AI

Benjawan Kjornrattanawanich

Y

Yu. A. Uspenskiǐ

DOI：10.1364/OL.30.003186

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Received July 20, 2005; revised manuscript received August 12, 2005; accepted August 16, 2005 We have fabricated periodic multilayers that comprise either Si/Tb or SiC/Tb bilayers, designed to operate as narrowband reflective coatings near 60 nm wavelength in the extreme ultraviolet (EUV). We find peak reflectance values in excess of 20% near normal incidence. The spectral bandpass of the best Si/Tb multilayer was measured to be 6.5 nm full width at half-maximum (FWHM), while SiC/Tb multilayers have a more broad response, of order 9.4 nm FWHM. Transmission electron microscopy analysis of Si/Tb multilayers reveals polycrystalline Tb layers, amorphous Si layers, and relatively large asymmetric amorphous interlayers. Thermal annealing experiments indicate excellent stability to 100 degrees C (I h) for Si/Tb. These new multilayer coatings have the potential for use in normal incidence instrumentation in a region of the EUV where efficient narrowband multilayers have not been available until now. In particular, reflective Si/Tb multilayers can be used for solar physics applications where the coatings can be tuned to important emission lines such as 0 V near 63.0 nm and Mg X near 61.0 nm. (c) 2005 Optical Society of America.

Keywords:

OPTICAL-CONSTANTS

REFLECTION

SCANDIUM

FILMS

Terbium-based extreme ultraviolet multilayers

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