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The influence of magnetic field on the cluster growth in a magnetron sputtering gas aggregation source

delete2025-03-01
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PRE
AI
J
João Coroa
G
Giuseppe Sanzone
T
Tibor Höltzl
H
Hailin Sun
E
Ewald Janssens
J
Jinlong Yin *
DOI:10.1016/j.surfcoat.2025.131892delete
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Abstract

Abstract

En 中文
Clusters produced by physical methods in gas phase have yet to see widespread adoption due to low deposition rates, despite the benefits that they could bring to many applications. It is demonstrated in this study that unbalancing the magnetic field configuration of a magnetron within a sputtering gas aggregation source significantly enhances dimer formation and subsequent cluster growth. Based on experimental results obtained with four magnetic field configurations, along with ab initio simulations, we discussed various scenarios for dimer formation and proposed that the contribution of ArPd+ is essential for an increase in cluster throughput. We analysed the resulting plasma spatial distribution and demonstrated that the selected magnetic field configuration significantly influences the lifetime of ArPd+ particles. When their lifetime is long, more ArPd+ can react with another metal atom (Pd) and form other stable complexes (Pd2, Pd2+ or ArPd2+), a critical first step in cluster growth, increasing cluster throughput by a factor of 150-fold. The proposed mechanism might be material-independent as other metal-argon dimers (ArCu+, ArTi+ and ArCo+) have also been reported in the literature.
Keywords:
Gas aggregation source
Magnetron sputtering
Magnetic field
Palladium clusters
Cluster growth
Nanoparticles
Ab initio simulations

Journal

Surface and Coatings Technology cover
Surface and Coatings Technology
IF:
6.1
Papers:
2.8W
Citations:
7.1W

Organization

B
budapest university of technology & economics
Scholars:
5.6K
Papers: 5.0K
Citations: 1
F
furukawa electric
Scholars:
518
Papers: 409
Citations: 0
K
KU Leuven
Scholars:
5.7W
Papers: 5.2W
Citations: 8.1W
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