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Two-dimensional optimized trapezoid self-convolution window for enhancing Moire-based lithography alignment

delete2025-05-01
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PRE
AI
F
Feifan Xu
C
Chengliang Pan
张进 (Jin Zhang)
W
Weishi Li
H
Haojie Xia *
DOI:10.1016/j.ymssp.2025.112590delete
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Abstract

Abstract

En 中文
Classical windows are widely used in image processing to suppress spectral leakage. However, their limited effectiveness constrains their application in high-precision measurement tasks, such as lithography alignment based on Moire fringe phase analysis. To address this limitation, this paper introduces an innovative two-dimensional optimized trapezoid self-convolution window (2D-OTSCW). This novel class of windows is generated through multiple time convolutions of an optimized trapezoid window, designed to achieve a narrow main lobe width of 6.89 pi/N and an optimal peak sidelobe level of - 31.6 dB by tuning the upper-to-lower base ratio (gamma = 16 %). Theoretical analyses confirm that increasing the convolution order enhances the sidelobe suppression capability of 2D-OTSCWs, thereby mitigating spectral leakage. Additionally, the performance of the 2D-OTSCWs is evaluated against two extreme self-convolution windows (SCWs) (i.e., triangular and rectangular SCWs). Simulation and experimental results demonstrate the superior performance of 2D-OTSCWs over classical windows, which significantly enhances the phase extraction accuracy. This improvement enables alignment precision at an impressive sub-2nm (1.86 nm) level, meeting the stringent requirements of next-generation lithography. This study not only introduces a robust window function design strategy for spectral analysis but also establishes a foundation for advancing high-precision alignment in lithography and related fields.
Keywords:
Lithography alignment
Image processing
Moire fringes
Self-convolution window (SCW)
Spectral leakage
Phase extraction

Journal

Mechanical Systems and Signal Processing cover
Mechanical Systems and Signal Processing
IF:
8.9
Papers:
1.3W
Citations:
6.6W

Organization

H
hefei univ technol
Scholars:
1.9K
Papers: 759
Citations: 248