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Ultra-strong, recyclable, self-healable and transparent polythiourethane-urea elastomer via physical-chemical dual-reversible networks synergy

delete2026-05-01
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L
Liang, Yingxia
L
Li, Lin
X
Xun Lu *
DOI:10.1039/d6ta01999ddelete
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Abstract

Abstract

En 中文
Thermosetting polyurethane elastomers exhibit excellent dimensional stability, thermal resistance, and mechanical strength, yet their permanent covalent cross-links hinder self-healing and recyclability. While dynamic cross-linking strategies address these limitations, they often compromise mechanical performance. Herein, we report an innovative polyurethane system with a synergistic dual reversible network: a physical network of multiple hydrogen bonds and pi-pi stacking, combined with a dynamic thiourethane covalent network. This dual-network system optimizes hard-domain dimensions and regulates microphase structure, endowing the elastomer with exceptional mechanical properties. The optimized elastomer (PTUU-C-2) achieves a tensile strength of 81.06 MPa (the highest reported for self-healing chemically cross-linked elastomers) and a toughness of 286.99 MJ m(-3). Enabled by the dual-dynamic network, the elastomer exhibits efficient self-healing (>= 80% recovery) and complete chemical recyclability via decross-linking, with the recycled thiol-terminated polymer having re-crosslinking potential via click chemistry. Additionally, it features high transparency (89.69% transmittance), low haze (1.23%), and suitable refractive index (1.49), showing promise in transparent protection, anti-counterfeiting and optical applications. This molecular-level strategy overcomes the traditional high performance-recyclability trade-off of cross-linked polyurethanes, offering a viable pathway toward advanced thermosets integrating excellent mechanical properties, self-healing, and full recyclability.
Keywords:
POLYURETHANES

Journal

Journal of Materials Chemistry A cover
Journal of Materials Chemistry A
IF:
9.5
Papers:
3.3W
Citations:
21.7W

Organization

S
south china university of technology
Scholars:
6.5W
Papers: 5.0W
Citations: 85
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