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Ultrafast multi-layer subtractive patterning
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DOI：10.1364/OE.26.011928.png)
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Abstract
En 中文
Subtractive femtosecond laser machining using multiple pulses with different spatial intensity profiles centred on the same position on a sample has been used to fabricate surface relief structuring. A digital micromirror device was used as an intensity spatial light modulator, with a fixed position relative to the sample, to ensure optimal alignment between successive masks. Up to 50 distinct layers, 335 nm lateral spatial resolution and 2.6 mu m maximum depth structures were produced. The lateral dimensions of the structures are approximately 40 mu m. Surface relief structuring is shown to match intended depth profiles in a nickel substrate, and highly repeatable stitching of identical features in close proximity is also demonstrated.
Keywords:
DIGITAL MICROMIRROR DEVICE
LASER-ABLATION
MASKLESS LITHOGRAPHY
FEMTOSECOND
FABRICATION
ELEMENTS
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