Understanding into the Microstructure and Diffusion Behaviors of Water Removal in Nanopores of Wafer by Supercritical Carbon Dioxide: Experiment and Molecular Dynamics Simulation

2025-09-19

PRE

Xinyu Zhuo

Weizhong Zheng *

Xu Yisheng

Weizhen Sun

Ling Zhao

DOI：10.1016/j.supflu.2025.106791

Original

Original request for help

Save

Abstract

En 中文

• Residual water removal within nanostructure with scCO2 was investigated. • IPA contributes to the better dispersion and dissolution of water droplet. • IPA molecules form ordered layers that reducing water-surface adhesion. • The drying efficiency shows distinct feature-size dependence.

Understanding into the Microstructure and Diffusion Behaviors of Water Removal in Nanopores of Wafer by Supercritical Carbon Dioxide: Experiment and Molecular Dynamics Simulation

Abstract

Journal

Organization

Cited Papers

Citing Papers