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Vacancy-induced single-atom Ni supported on V−doped h−BN for dry reforming of methane: Reaction pathway reconstruction and coking resistance mechanism
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DOI:10.1016/j.mcat.2026.116251.png)
Abstract
En 中文
• N vacancies reconstruct interfacial structure, shifting oxygen transfer to OH*-assisted pathways. • C* + OH* → COH* barrier drops from 0.732 eV to 0.084 eV, suppressing coke formation. • CH* converts via OH*-mediated intermediates, avoiding deep dehydrogenation to C*. • N vacancies redirect surface H* consumption toward H2 rather than H2O formation. • Rate-determining step shifts from coke-prone C* generation to CH2* dehydrogenation.
Keywords:
N vacancy
Doping h−BN
Dry reforming of methane
Coking resistance
DFT
Journal
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4.9
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