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J

Jon F. Ihlefeld

university of virginia

43H-index
325Paper Count
7.8KCitation Count
Published Papers 123
Publication Date
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Ferroelectric Dynamic-Field-Driven Nucleation and Growth Model for Predictive Materials-To-Circuit Co-Design
errAdvanced Materials
IF26.8
err2026-06-13
err0
errOAAI
errYi Liang; Soohyeon Kim; Tony Chiang; Megan K. Lenox; Ian Mercer; John J. Plombon; Jon-Paul Maria; Jon F. Ihlefeld; Wenhao Sun; Wei Lu; John T. Heron
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Electrode and Microstructure Dependence of Oxygen Diffusion in Ferroelectric Hafnium Zirconium Oxide Thin Films
errAdvanced Functional Materials
IF19
err2026-05-01
err0
errOAAI
errShvilberg, Liron; Pfeifer, Thomas W.; Zhou, Chuanzhen; Choi, Yong Kyu; Choe, Duk-Hyun; Hopkins, Patrick E.; Ihlefeld, Jon F.
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Nanoscale Phase Identification Using Two-Dimensional Pair Correlation Functions: A Case Study on Hafnium Oxide
errMICROSCOPY AND MICROANALYSIS
IF3
err2025-10-01
err0
errOAAI
errCalderon, V. S.; Evans, Charles; Jaszewski, Samantha T.; Ihlefeld, Jon F.; Dickey, Elizabeth C.
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errSave
Environmental Control of Ferroelectricity in Hafnia Films
errAdvanced Materials
IF26.8
err2025-08-07
err0
errOAAI
errWaseem Ahmad Wani; Nicolas K. Lam; Kristina M. Holsgrove; Gerald Bejger; Tinsae Alem; Kory Burns; Stephen J. McDonnell; Christina M. Rost; Amit Kumar; Jon F. Ihlefeld; Brian J. Rodriguez
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Electrode Interface Effects in Hafnium Zirconium Oxide Ferroelectrics
errMicroscopy and Microanalysis
IF3
err2025-07-25
err0
PREAI
errEce Gunay; Sebastian Calderon; Benjamin Aronson; Jon Ihlefeld; Elizabeth Dickey
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Annealing Optimization for HZO Thin Films with <i>In-Situ</i> STEM EBIC Characterization
errMicroscopy and Microanalysis
IF3
err2025-07-25
err0
PREAI
errYueyun Chen; Ho Leung Chan; Tristan P O’Neill; Megan K Lenox; William A Hubbard; Jon F Ihlefeld; B C Regan
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errSave
Effect of Precursor Purge Time on Plasma-Enhanced Atomic Layer Deposition-Prepared Ferroelectric Hf0.5Zr0.5O2 Phase and Performance
errACS OMEGA
IF4.3
err2025-05-14
err0
errOAAI
errChoi, YK; Holsgrove, K; Watson, A; Aronson, BL; Lenox, MK; Shvilberg, L; Zhou, CZ; Fields, SS; Wang, SH; McDonnell, SJ; Kumar, A; Ihlefeld, JF
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Modifications in the charge trap landscape in Hf0.5Zr0.5O2 as a function of oxygen vacancy concentration observed with photoemission electron microscopy
errAPPLIED PHYSICS LETTERS
IF3.6
err2025-04-14
err0
PREAI
errVega, Fernando; Boehm, Alex; Kim, Andrew R.; Jaszewski, Samantha; Ohta, Taisuke; Ihlefeld, Jon; Beechem, Thomas
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Multistate resistance in TaN/(Hf,Zr)O2/Ta ferroelectric tunnel junctions
errJOURNAL OF APPLIED PHYSICS
IF2.5
err2025-04-14
err0
errOAAI
errHenry, M. David; Stoltzfus, David; Lenox, Megan K.; Jaszewski, Samantha T.; Young, Travis; Ihlefeld, Jon F.
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Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films(vol 124, 252905 , 2024)
errAPPLIED PHYSICS LETTERS
IF3.6
err2025-01-24
err0
PREAI
errShvilberg, Liron; Zhou, Chuanzhen; Lenox, Megan K.; Aronson, Benjamin L.; Lam, Nicolas K.; Jaszewski, Samantha T.; Opila, Elizabeth J.; Ihlefeld, Jon F.
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errSave
Geometric effects in the measurement of the remanent ferroelectric polarization at the nanoscale
errAPPLIED PHYSICS LETTERS
IF3.6
err2025-01-14
err0
PREAI
errChiang, Tony; Lenox, Megan K.; Ma, Tao; Ihlefeld, Jon F.; Heron, John T.
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errSave
Conductive filament formation in the failure of Hf0.5Zr0.5O2 ferroelectric capacitors
errAPL MATERIALS
IF4.5
err2025-01-13
err0
errOAAI
errWebb, Matthew; Chiang, Tony; Lenox, Megan K.; Gray, Jordan; Ma, Tao; Ihlefeld, Jon F.; Heron, John T.
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errSave
Electrode Elastic Modulus as the Dominant Factor in the Capping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2024-12-03
err0
PREAI
errLenox, Megan K.; Islam, Md Rafiqul; Hoque, Md Shafkat Bin; Skidmore, Chloe H.; Salanova, Alejandro; Fields, Shelby S.; Jaszewski, Samantha T.; Maria, Jon-Paul; Hopkins, Patrick E.; Ihlefeld, Jon F.
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An Antiferroelectric-Coated Metal Foam Infiltrated with Liquid Metal as a Dielectric Capacitor
errENERGY TECHNOLOGY
IF3.6
err2024-10-07
err0
PREAI
errHanrahan, Brendan; Leff, Asher; Sesar, Alexis; Fish, Michael; Jaszewski, Samantha T.; Kropp, Jaron A.; Strnad, Nicholas; Ihlefeld, Jon F.; Lazarus, Nathan
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errSave
Mapping Ferroelectric Fields Reveals the Origins of the Coercivity Distribution
errACS NANO
IF16
err2024-07-17
err0
errOAAI
errChan, Ho Leung; Fields, Shelby S.; Chen, Yueyun; O'Neill, Tristan P.; Lenox, Megan K.; Hubbard, William A.; Ihlefeld, Jon F.; Regan, Brian C.
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errSave
Photoinduced patterning of oxygen vacancies to promote the ferroelectric phase of Hf0.5Zr0.5O2 (Vol 124, 062902, 2024)
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-06-27
err0
PREAI
errBeechem, Thomas E.; Vega, Fernando; Jaszewski, Samantha T.; Aronson, Benjamin L.; Kelley, Kyle P.; Ihlefeld, Jon. F.
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errSave
Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-06-20
err4
PREAI
errShvilberg, Liron; Zhou, Chuanzhen; Lenox, Megan K.; Aronson, Benjamin L.; Lam, Nicolas K.; Jaszewski, Samantha T.; Opila, Elizabeth J.; Ihlefeld, Jon F.
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errSave
Increased thermal conductivity and decreased electron-phonon coupling factor of the aluminum scandium intermetallic phase (Al3Sc) compared to solid solutions
errAPPLIED PHYSICS LETTERS
IF3.6
err2024-05-15
err2
PREAI
errHirt, Daniel; Islam, Md. Rafiqul; Bin Hoque, Md. Shafkat; Hutchins, William; Makarem, Sara; Lenox, Megan K.; Riffe, William T.; Ihlefeld, Jon F.; Scott, Ethan A.; Esteves, Giovanni; Hopkins, Patrick E.
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Internal Photoemission Spectroscopy Measurements of Interfacial Energy Barriers in Operating TaN/Hf0.5Zr0.5O2/TaN Metal/Ferroelectric/Metal (MFM) Devices
errACS APPLIED ELECTRONIC MATERIALS
IF4.7
err2024-04-30
err0
PREAI
errHaglund, Jessica; Mimura, Takanori; Ihlefeld, Jon F.; Conley, John F.
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Effect of background gas composition on the stoichiometry and lithium ion conductivity of pulse laser deposited epitaxial lithium lanthanum tantalate (Li3xLa1/3-xTaO3)
errJOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
IF2.1
err2024-04-10
err0
errOAAI
errBrummel, Ian A.; Zhou, Chuanzhen; Ihlefeld, Jon F.
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Research Directions

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