Jon F. Ihlefeld - Publications, H-index & Citations

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Jon F. Ihlefeld

University of Virginia

43H-index

336Paper Count

7.8KCitation Count

Published Papers 130

Publication Date

Thermal conductivity and optical phonon scattering of CMOS compatible aluminum nitride based ferroelectric thin films

Nature Communications

IF15.7

2026-09-11

OAAI

Sara Makarem; Ian Mercer; Saman Zare; Michael S. Lafferty; Thomas W. Pfeifer; William Hutchins; Daniel Hirt; Ethan A. Scott; Jon F. Ihlefeld; Susan Trolier-McKinstry; Jon-Paul Maria; Patrick E. Hopkins

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Robust Antiferroelectric Response in the Pbca Phase of Hafnium Zirconium Oxide via Aluminum Substitution

Journal of the American Ceramic Society

IF3.8

2026-09-06

OAAI

Yong Kyu Choi; MinChul Kang; Tinsae Alem; Nicolas K. Lam; Andrea L. Watson; Kory Burns; Stephen J. McDonnell; Lin Zhou; Jon F. Ihlefeld

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Enhanced Ferroelectric Phase Formation via Local Structure Modification in the Pre-Crystalline State of Hafnium Zirconium Oxide Thin Films

Advanced Functional Materials

IF19

2026-09-02

OAAI

Nicolas K. Lam; Gerald R. Bejger; Waseem A. Wani; Kristina M. Holsgrove; Andrew N. Titus; Niyorjyoti Sharma; Shihao Wang; Keithen Orson; Megan K. Lenox; Liron Shvilberg; Yong Kyu Choi; Ian A. Brummel; Benjamin L. Aronson; Petra Reinke; Quentin Ramasse; Amit Kumar; Brian J. Rodriguez; Christina M. Rost; Jon F. Ihlefeld

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Electron Energy Loss as a Phase Identification Tool in Hafnium Zirconium Oxide Ferroelectrics

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Ece Gunay; Sebastian Calderon; Benjamin Aronson; Jon F Ihlefeld; Elizabeth Dickey

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Correlative Nanoscale Spectroscopy and Diffraction of Metastable Phases in Hf0.5Zr0.5O2

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Nooreen T Qureshi; Luke C Johnson; Jordan A Hachtel; Thomas E Beechem; Jon F Ihlefeld; Kory Burns

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Investigating Thermal Depolarization and Repolarization of Ferroelectric HZO with In Situ TEM and STEM EBIC

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Tristan P O’Neill; Yueyun Chen; Ho Leung Chan; Megan K Lenox; William A Hubbard; Jon F Ihlefeld; B C Regan

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Electrode Grains Template Ferroelectric Domains in a Hafnia-Based Capacitor

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Yueyun Chen; Tristan P O’Neill; Ho Leung Chan; Megan K Lenox; William A Hubbard; Jon F Ihlefeld; B C Regan

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Ferroelectric Dynamic-Field-Driven Nucleation and Growth Model for Predictive Materials-To-Circuit Co-Design

Advanced Materials

IF26.8

2026-06-13

OAAI

Yi Liang; Soohyeon Kim; Tony Chiang; Megan K. Lenox; Ian Mercer; John J. Plombon; Jon-Paul Maria; Jon F. Ihlefeld; Wenhao Sun; Wei Lu; John T. Heron

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Electrode and Microstructure Dependence of Oxygen Diffusion in Ferroelectric Hafnium Zirconium Oxide Thin Films

Advanced Functional Materials

IF19

2026-05-01

OAAI

Shvilberg, Liron; Pfeifer, Thomas W.; Zhou, Chuanzhen; Choi, Yong Kyu; Choe, Duk-Hyun; Hopkins, Patrick E.; Ihlefeld, Jon F.

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Nanoscale Phase Identification Using Two-Dimensional Pair Correlation Functions: A Case Study on Hafnium Oxide

MICROSCOPY AND MICROANALYSIS

IF3

2025-10-01

OAAI

Calderon, V. S.; Evans, Charles; Jaszewski, Samantha T.; Ihlefeld, Jon F.; Dickey, Elizabeth C.

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Environmental Control of Ferroelectricity in Hafnia Films

Advanced Materials

IF26.8

2025-08-07

OAAI

Waseem Ahmad Wani; Nicolas K. Lam; Kristina M. Holsgrove; Gerald Bejger; Tinsae Alem; Kory Burns; Stephen J. McDonnell; Christina M. Rost; Amit Kumar; Jon F. Ihlefeld; Brian J. Rodriguez

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Electrode Interface Effects in Hafnium Zirconium Oxide Ferroelectrics

Microscopy and Microanalysis

IF3

2025-07-25

PREAI

Ece Gunay; Sebastian Calderon; Benjamin Aronson; Jon Ihlefeld; Elizabeth Dickey

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Annealing Optimization for HZO Thin Films with In-Situ STEM EBIC Characterization

Microscopy and Microanalysis

IF3

2025-07-25

PREAI

Yueyun Chen; Ho Leung Chan; Tristan P O’Neill; Megan K Lenox; William A Hubbard; Jon F Ihlefeld; B C Regan

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Effect of Precursor Purge Time on Plasma-Enhanced Atomic Layer Deposition-Prepared Ferroelectric Hf0.5Zr0.5O2 Phase and Performance

ACS OMEGA

IF4.3

2025-05-14

OAAI

Choi, YK; Holsgrove, K; Watson, A; Aronson, BL; Lenox, MK; Shvilberg, L; Zhou, CZ; Fields, SS; Wang, SH; McDonnell, SJ; Kumar, A; Ihlefeld, JF

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Modifications in the charge trap landscape in Hf0.5Zr0.5O2 as a function of oxygen vacancy concentration observed with photoemission electron microscopy

APPLIED PHYSICS LETTERS

IF3.6

2025-04-14

PREAI

Vega, Fernando; Boehm, Alex; Kim, Andrew R.; Jaszewski, Samantha; Ohta, Taisuke; Ihlefeld, Jon; Beechem, Thomas

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Multistate resistance in TaN/(Hf,Zr)O2/Ta ferroelectric tunnel junctions

JOURNAL OF APPLIED PHYSICS

IF2.5

2025-04-14

OAAI

Henry, M. David; Stoltzfus, David; Lenox, Megan K.; Jaszewski, Samantha T.; Young, Travis; Ihlefeld, Jon F.

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Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films(vol 124, 252905 , 2024)

APPLIED PHYSICS LETTERS

IF3.6

2025-01-24

PREAI

Shvilberg, Liron; Zhou, Chuanzhen; Lenox, Megan K.; Aronson, Benjamin L.; Lam, Nicolas K.; Jaszewski, Samantha T.; Opila, Elizabeth J.; Ihlefeld, Jon F.

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Geometric effects in the measurement of the remanent ferroelectric polarization at the nanoscale

APPLIED PHYSICS LETTERS

IF3.6

2025-01-14

PREAI

Chiang, Tony; Lenox, Megan K.; Ma, Tao; Ihlefeld, Jon F.; Heron, John T.

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Conductive filament formation in the failure of Hf0.5Zr0.5O2 ferroelectric capacitors

APL MATERIALS

IF4.5

2025-01-13

OAAI

Webb, Matthew; Chiang, Tony; Lenox, Megan K.; Gray, Jordan; Ma, Tao; Ihlefeld, Jon F.; Heron, John T.

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Electrode Elastic Modulus as the Dominant Factor in the Capping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2024-12-03

PREAI

Lenox, Megan K.; Islam, Md Rafiqul; Hoque, Md Shafkat Bin; Skidmore, Chloe H.; Salanova, Alejandro; Fields, Shelby S.; Jaszewski, Samantha T.; Maria, Jon-Paul; Hopkins, Patrick E.; Ihlefeld, Jon F.

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Research Directions