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SaveInvestigation of the etching mechanism of silicon nitride by CF4/O2/Ar gas mixture plasma in ICP
Gong, Liyue; Luo, Qian; Tan, Ziyan; Li, Chan; Li, Na; Wang, Xinjie; Gao, Fei; Liu, Yongxin; Bi, Zhenhua; Mei, Xianxiu Share Save Share Save Effects of low melting point SnBi58 alloy on the properties of isotropic conductive adhesivesZhang, Weiwei; Zhang, Zheng; Liu, Hao; Wang, Jianqiang; Duan, Fangcheng; Lv, Ziwen; Chen, Wentong; Wang, Xinjie; Li, Mingyu; Chen, Chuantong; Chen, Hongtao Share Save Share Save Share Save A Multilayer Paste Based on Ag Nanoparticles with Cu@Sn for Die Attachment in Power Device PackagingWang, Jintao; Wang, Xinjie; Zhang, Lin; Zhang, Luobin; Duan, Fangcheng; Wang, Fengyi; Zhang, Weiwei; Wang, Jianqiang; Zhang, Zheng; Hang, Chunjin; Chen, Hongtao Share Save Share Save Share Save Share Save 
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