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Thomas Nelis

Bern University of Applied Science

17H-index
74Paper Count
983Citation Count
Published Papers 23
Publication Date
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Different Plasma Polishing Regimes Induced by Electrolytic Flow
errJournal of Manufacturing and Materials Processing
IF3.3
err2026-08-01
err0
errOAAI
errAdel Ghezri; Yan Scholl; Nick Huber; Killang Pratama; Thomas Nelis; Jürgen Burger; Cedric Bessire
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Morphology and yield of W nanoparticles in gas aggregation: Pathways towards functional nanocomposite films
errSurface and Coatings Technology
IF6.1
err2025-12-17
err0
errOAAI
errEmese Huszar; Rita Dobszay; Peter Schweizer; Thomas Nelis; Daniele Casari; Dominik Gutnik; Amit Sharma; Johann Michler; Ralph Spolenak; Laszlo Pethö; Barbara Putz
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Surface Finishing of Additive Manufactured Titanium Alloy by Plasma Electrolytic Polishing Without Pretreatments
errMaterials 2025, Vol. 18, Page 4719
IF0
err2025-10-15
err0
errOAAI
errAdel Ghezri; Thomas Nelis; Jürgen Burger; Cedric Bessire
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errSave
Energy Efficient Jet Polishing via Electrolytic Plasma Enhances Corrosion Resistance in Stainless Steel
errJOURNAL OF MANUFACTURING AND MATERIALS PROCESSING
IF3.3
err2024-12-12
err0
errOAAI
errGhezri, Adel; Pratama, Killang; Scholl, Yan; Kuenzi, Alexander; Nelis, Thomas; Burger, Juergen; Bessire, Cedric
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errSave
Energy-Resolving Time-of-Flight Mass Spectrometry for Bulk Plasma Analysis
errJOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY
IF2.7
err2024-07-11
err0
errOAAI
errWatzek, Malte; Sturm, Patrick; Stoermer, Carsten; Bensaoula, Abdelhak; Nelis, Thomas; Hain, Caroline
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Microstructure and mechanical properties of Ti-Nb alloys: comparing conventional powder metallurgy, mechanical alloying, and high power impulse magnetron sputtering processes for supporting materials screening
errJOURNAL OF MATERIALS SCIENCE
IF3.9
err2024-05-19
err3
errOAAI
errMarczewski, M.; Wieczerzak, K.; Maeder, X.; Lapeyre, L.; Hain, C.; Jurczyk, M.; Nelis, T.
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Deposition and characterisation of c-axis oriented AlScN thin films via microwave plasma-assisted reactive HiPIMS
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2023-07-01
err6
errOAAI
errLapeyre, L.; Hain, C.; Sturm, P.; Metzger, J.; Borzi, A.; Wieczerzak, K.; Raynaud, P.; Michler, J.; Nelis, T.
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Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2023-02-01
err10
errOAAI
errHain, Caroline; Schweizer, Peter; Sturm, Patrick; Borzi, Aurelio; Thomet, Jonathan E.; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas
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Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2022-11-01
err13
errOAAI
errLapeyre, L.; Wieczerzak, K.; Hain, C.; Metzger, J.; Sharma, A.; Bensaoula, A.; Michler, J.; Nelis, T.
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From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2022-02-01
err11
errOAAI
errHain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzysztof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas
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Microstructure-driven strengthening of TiB2 coatings deposited by pulsed magnetron sputtering
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2019-06-01
err42
PREAI
errPolyakov, M. N.; Morstein, M.; Maeder, X.; Nelis, T.; Lundin, D.; Wehrs, J.; Best, J. P.; Edwards, T. E. J.; Dobelif, M.; Michler, J.
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Compressed sensing spectral imaging for plasma optical emission spectroscopy
errJOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
IF3.1
err2016-01-01
err19
PREAI
errUsala, John D.; Maag, Adrian; Nelis, Thomas; Gamez, Gerardo
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errSave
Further insights into prepeak emission in pulsed radiofrequency glow discharge
errSPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
IF3.8
err2013-07-01
err3
PREAI
errValledor, Rebeca; Vega, Paola; Pisonero, Jorge; Nelis, Thomas; Bordel, Nerea
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errSave
Bidimensional characterization of the emission spectra in a direct current atmospheric pressure glow discharge
errSPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
IF3.8
err2012-10-01
err10
PREAI
errOrejas, Jaime; Pisonero, Jorge; Bordel, Nerea; Nelis, Thomas; Guillot, Philippe; Sanz-Medel, Alfredo
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errSave
Spatial emission distribution of a pulsed radiofrequency glow discharge: Influence of the pulse frequency
errSPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
IF3.8
err2012-02-01
err8
PREAI
errValledor, Rebeca; Pisonero, Jorge; Nelis, Thomas; Bordel, Nerea
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errSave
Characterization of argon metastable species as function of time, space, and current of a pulsed dc glow discharge
errSPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY
IF3.8
err2011-08-01
err17
PREAI
errLotito, G.; Nelis, T.; Guillot, Ph.; Guenther, D.
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Spatial characterization of pressure-based plasma regimes in a radiofrequency glow discharge by using optical emission spectroscopy
errJOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
IF3.1
err2011-01-01
err7
errOAAI
errValledor, Rebeca; Pisonero, Jorge; Nelis, Thomas; Bordel, Nerea
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errSave
The concept of plasma cleaning in glow discharge spectrometry
errJOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
IF3.1
err2009-01-01
err44
errOAAI
errMolchan, I. S.; Thompson, G. E.; Skeldon, P.; Trigoulet, N.; Chapon, P.; Tempez, A.; Malherbe, J.; Lobo Revilla, L.; Bordel, N.; Belenguer, Ph.; Nelis, T.; Zahri, A.; Therese, L.; Guillot, Ph.; Ganciu, M.; Michler, J.; Hohl, M.
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A simple method for measuring plasma power in rf-GDOES instruments
errANALYTICAL AND BIOANALYTICAL CHEMISTRY
IF3.8
err2007-08-04
err7
PREAI
errNelis, T.; Aeberhard, M.; Rohr, L.; Michler, J.; Belenguer, P.; Guillot, P.; Therese, L.
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errSave
Glow discharge as a tool for surface and interface analysis
errAPPLIED SPECTROSCOPY REVIEWS
IF5.4
err2006-07-01
err62
PREAI
errNelis, T; Pallosi, J
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Research Directions

No research directions
Co-authors
Cooperation Journals
G
G.E. Thompson
H-index: 92 · Papers: 1.1K
P
P. Skeldon
H-index: 76 · Papers: 830
J
Johann Michler
H-index: 67 · Papers: 730
A
Alfredo Sanz‐Medel
H-index: 66 · Papers: 988
R
Ralph Spolenak
H-index: 55 · Papers: 351
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