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SaveFerroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges
Celano, Umberto; Gomez, Andres; Piedimonte, Paola; Neumayer, Sabine; Collins, Liam; Popovici, Mihaela; Florent, Karine; McMitchell, Sean R. C.; Favia, Paola; Drijbooms, Chris; Bender, Hugo; Paredis, Kristof; Di Piazza, Luca; Jesse, Stephen; Van Houdt, Jan; van der Heide, Paul Share Save Share Save Atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysisAbrenica, Graniel Harne A.; Lebedev, Mikhail, V; Fingerle, Mathias; Arnauts, Sophia; Bazzazian, Nazaninsadat; Calvet, Wolfram; Porret, Clement; Bender, Hugo; Mayer, Thomas; de Gendt, Stefan; van Dorp, Dennis H. Share Save Share Save Share Save Share Save Share Save Share Save Defect evaluation in strain-relaxed Ge0.947Sn0.053 grown on (001) SiGupta, S.; Shimura, Y.; Richard, O.; Douhard, B.; Simoen, E.; Bender, H.; Nakatsuka, O.; Zaima, S.; Loo, R.; Heyns, M. Share Save Two-Dimensional Crystal Grain Size Tuning in WS2 Atomic Layer Deposition: An Insight in the Nucleation MechanismGroven, Benjamin; Mehta, Ankit Nalin; Bender, Hugo; Meersschaut, Johan; Nuytten, Thomas; Verdonck, Patrick; Conard, Thierry; Smets, Quentin; Schram, Tom; Schoenaers, Ben; Stesmans, Andre; Afanas'ev, Valeri; Vandervorst, Wilfried; Heyns, Marc; Caymax, Matty; Radu, Iuliana; Delabie, Annelies Share Save Electrical properties of extended defects in strain relaxed GeSnGupta, Somya; Simoen, Eddy; Loo, Roger; Shimura, Yosuke; Porret, Clement; Gencarelli, Federica; Paredis, Kristof; Bender, Hugo; Lauwaert, Johan; Vrielinck, Henk; Heyns, Marc Share Save Voltage-controlled reverse filament growth boosts resistive switching memoryBelmonte, Attilio; Celano, Umberto; Chen, Zhe; Radhaskrishnan, Janaki; Redolfi, Augusto; Clima, Sergiu; Richard, Olivier; Bender, Hugo; Kar, Gouri Sankar; Vandervorst, Wilfried; Goux, Ludovic Share Save Anisotropic stress in narrow sGe fin field-effect transistor channels measured using nano-focused Raman spectroscopyNuytten, T.; Bogdanowicz, J.; Witters, L.; Eneman, G.; Hantschel, T.; Schulze, A.; Favia, P.; Bender, H.; De Wolf, I.; Vandervorst, W. Share Save The flexoelectric effect in Al-doped hafnium oxideCelano, Umberto; Popovici, Mihaela; Florent, Karine; Lavizzari, Simone; Favia, Paola; Paulussen, Kris; Bender, Hugo; di Piazza, Luca; Van Houdt, Jan; Vandervorst, Wilfried Share Save Correlation between surface reconstruction and polytypism in InAs nanowire selective area epitaxyLiu, Ziyang; Merckling, Clement; Rooyackers, Rita; Richard, Olivier; Bender, Hugo; Mols, Yves; Vila, Maria; Rubio-Zuazo, Juan; Castro, German R.; Collaert, Nadine; Thean, Aaron; Vandervorst, Wilfried; Heyns, Marc Share Save MoS2 Functionalization with a Sub-nm Thin SiO2 Layer for Atomic Layer Deposition of High-κ DielectricsZhang, Haodong; Arutchelvan, Goutham; Meersschaut, Johan; Gaur, Abhinav; Conard, Thierry; Bender, Hugo; Lin, Dennis; Asselberghs, Inge; Heyns, Marc; Radu, Iuliana; Vandervorst, Wilfried; Delabie, Annelies Share Save Atomic Layer Deposition of Ruthenium Thin Films from (Ethylbenzyl) (1-Ethyl-1,4-cyclohexadienyl) Ru: Process Characteristics, Surface Chemistry, and Film PropertiesPopovici, Mihaela; Groven, Benjamin; Marcoen, Kristof; Quan Manh Phung; Dutta, Shibesh; Swerts, Johan; Meersschaut, Johan; van den Berg, Jaap A.; Franquet, Alexis; Moussa, Alain; Vanstreels, Kris; Lagrain, Pieter; Bender, Hugo; Jurczak, Malgorzata; Van Elshocht, Sven; Delabie, Annelies; Adelmann, Christoph Share Save Plasma-Enhanced Atomic Layer Deposition of Two-Dimensional WS2 from WF6, H2 Plasma, and H2SGroven, Benjamin; Heyne, Markus; Mehta, Ankit Nalin; Bender, Hugo; Nuytten, Thomas; Meersschaut, Johan; Conard, Thierry; Verdonck, Patrick; Van Elshocht, Sven; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Radu, Iuliana; Caymax, Matty; Delabie, Annelies Share Save Share Save 
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