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SaveShare Save Share Save Share Save Share Save Share Save Share Save Share Save Share Save Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism
Zhu, Xiaoxiao; Ding, Juxuan; Mo, Zhangchao; Jiang, Xuesong; Sun, Jifei; Fu, Hao; Gui, Yuziyu; Ban, Boyuan; Wang, Ling; Chen, Jian Share Save Share Save Ternary Compensation Enables High-sensitive Efficient Upconversion Device for NIR VisualizationDong, Shilong; Li, Jin; Ma, Tianjiao; Zhang, Ming; Zhu, Lei; Gao, Xiaxin; Ma, Manping; Yuan, Wenqiang; Wang, Zaiyu; Liu, Feng; Jiang, Xuesong Share Save Unraveling the nanostructures and self-assembly behavior of perfluorosulfonic acid in water/ethanol solvent: Effect of EW and side-chain chemistrySong, Jingnan; Wang, Suyan; Zhao, Wutong; Hao, Bonan; Zhang, Ming; Zou, Yecheng; Wei, Gang; Liu, Jia; Chen, Guangying; Ren, Huan; Wu, Xuefei; Jiang, Xuesong; Zhou, Yongfeng; Liu, Feng; Zhang, Yongming Share Save Share Save Share Save Share Save Share Save Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasivesZhu, Xiaoxiao; Gui, Yuziyu; Fu, Hao; Ding, Juxuan; Mo, Zhangchao; Jiang, Xuesong; Sun, Jifei; Ban, Boyuan; Wang, Ling; Chen, Jian Share Save Stimuli-responsive mechanically interlocked polymer wrinklesYang, Mengling; Chen, Shuai; Zhang, Zhaoming; Cheng, Lin; Zhao, Jun; Bai, Ruixue; Wang, Wenbin; Gao, Wenzhe; Yu, Wei; Jiang, Xuesong; Yan, Xuzhou Share Save Share Save 
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