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Positive Role of Iodine Atoms in Chemically Amplified Photoresists for Extreme Ultraviolet Lithography Ku, Yejin; Park, Han Bit; Kim, Gayoung; Choi, Hyo-Eun; Lee, Jin-Kyun; Lee, Jong-Won; Lee, Sangsul; Kim, Jeongsik; Hur, Myounghyun; Kim, Jaehyun Share Save
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Tin-Oxo Nanocluster Composite Films as Positive-Tone Photoresist for Extreme UV Lithography Kim, G; Ku, YJ; Jeon, S; Lee, JK; Lee, SHY; Jung, BJ; Lee, SI; Ryu, C; Park, K; Jung, YL; Jeong, C; Choi, J Share Save
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Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV Exposure Oh, Hyun-Taek; Kim, Gayoung; Jung, Seok-Heon; Ku, Yejin; Lee, Jin-Kyun; Kim, Kanghyun; Park, Byeong-Gyu; Lee, Sangsul; Koh, Chawon; Nishi, Tsunehiro; Kim, Hyun-Woo Share Save
Non-equilibrium transport in polymer mixed ionic-electronic conductors at ultrahigh charge densities Tjhe, Dionisius H. L.; Ren, Xinglong; Jacobs, Ian E.; D'Avino, Gabriele; Mustafa, Tarig B. E.; Marsh, Thomas G.; Zhang, Lu; Fu, Yao; Mansour, Ahmed E.; Opitz, Andreas; Huang, Yuxuan; Zhu, Wenjin; Unal, Ahmet Hamdi; Hoek, Sebastiaan; Lemaur, Vincent; Quarti, Claudio; He, Qiao; Lee, Jin-Kyun; McCulloch, Iain; Heeney, Martin; Koch, Norbert; Grey, Clare P.; Beljonne, David; Fratini, Simone; Sirringhaus, Henning Share Save
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