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Guy Vereecke

imec, kapeldreef 75, 3001 leuven, belgium

19H-index
187Paper Count
1.6KCitation Count
Published Papers 19
Publication Date
Rationally Designed Solid Sorbent Electrolyte Exhibits Dual CO2/ H2O Sorption and Enables Full Gas Phase CO2 Reduction
err2025-10-08
err0
PREAI
errMarieke S. van Leeuwen; Seger Witteveen; Guy Vereecke; Nina Plankensteiner; Martijn J.W. Blom; Philippe M. Vereecken
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Impact of La-OH bonds on the retention of Co/LaSiO CBRAM
err2020-10-12
err5
errOAAI
errRadhakrishnan, J.; Belmonte, A.; Nyns, L.; Devulder, W.; Vereecke, G.; Donadio, G. L.; Kumbhare, P.; Delhougne, R.; Houssa, M.; Kar, G. S.; Goux, L.
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Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer
err2018-10-12
err20
PREAI
errde Marneffe, Jean-Francois; Chan, Boon Teik; Spieser, Martin; Vereecke, Guy; Naumov, Sergej; Vanhaeren, Danielle; Wolf, Heiko; Knoll, Armin W.
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In-situ ATR-FTIR for dynamic analysis of superhydrophobic breakdown on nanostructured silicon surfaces
err2018-08-02
err22
errOAAI
errVrancken, Nandi; Li, Jiaqi; Sergeant, Stefanie; Vereecke, Guy; Doumen, Geert; Holsteyns, Frank; Chen, Chang; Terryn, Herman; De Gendt, Stefan; Xu, XiuMei
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Superhydrophobic Breakdown of Nanostructured Surfaces Characterized in Situ Using ATR-FTIR
err2017-04-10
err24
errOAAI
errVrancken, Nandi; Sergeant, Stefanie; Vereecke, Guy; Doumen, Geert; Holsteyns, Frank; Terryn, Herman; De Gendt, Stefan; Xu, XiuMei
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Full wetting of plasmonic nanopores through two-component droplets
err2015-01-01
err14
errOAAI
errChen, Chang; Xu, XiuMei; Li, Yi; Jans, Hilde; Neutens, Pieter; Kerman, Sarp; Vereecke, Guy; Holsteyns, Frank; Maes, Guido; Lagae, Liesbet; Stakenborg, Tim; van Dorpe, Pol
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High-Frequency Acoustic for Nanostructure Wetting Characterization
err2014-06-17
err19
errOAAI
errLi, Sizhe; Lamant, Sebastien; Carlier, Julien; Toubal, Malika; Campistron, Pierre; Xu, Xiumei; Vereecke, Guy; Senez, Vincent; Thomy, Vincent; Nongaillard, Bertrand
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Capturing Wetting States in Nanopatterned Silicon
err2014-01-13
err55
PREAI
errXu, XiuMei; Vereecke, Guy; Chen, Chang; Pourtois, Geoffrey; Armini, Silvia; Verellen, Niels; Tsai, Wei-Kang; Kim, Dong-Wook; Lee, Eunsongyi; Lin, Chang-You; Van Dorpe, Pol; Struyf, Herbert; Holsteyns, Frank; Moshchalkov, Victor; Indekeu, Joseph; De Gendt, Stefan
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Towards Fully Aqueous Ozone Wet Strip of 193 nm Photoresist Stack Using UV Pre-Treatments in Low-k Patterning Applications
err2012-01-01
err6
PREAI
errKesters, E.; Le, Q. T.; Lux, M.; Pittevils, J.; Vereecke, G.; Struyf, H.; De Gendt, S.
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Effect of UV Irradiation on Modification and Subsequent Wet Removal of Model and Post-Etch Fluorocarbon Residues
err2012-01-01
err26
errOAAI
errLe, Q. T.; de Marneffe, J. -F.; Conard, T.; Vaesen, I.; Struyf, H.; Vereecke, G.
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Stabilization of ambient sensitive atomic layer deposited lanthanum aluminates by annealing and in situ capping
err2011-03-08
err12
PREAI
errSwerts, J.; Gielis, S.; Vereecke, G.; Hardy, A.; Dewulf, D.; Adelmann, C.; Van Bael, M. K.; Van Elshocht, S.
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Degradation of 248 nm Deep UV Photoresist by Ion Implantation
err2011-01-01
err10
PREAI
errTsvetanova, D.; Vos, R.; Vereecke, G.; Parac-Vogt, T. N.; Clemente, F.; Vanstreels, K.; Radisic, D.; Conard, T.; Franquet, A.; Jivanescu, M.; Nguyen, D. A. P.; Stesmans, A.; Brijs, B.; Mertens, P.; Heyns, M. M.
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Removal of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent
err2011-01-01
err10
errOAAI
errTsvetanova, D.; Vos, R.; Vanstreels, K.; Radisic, D.; Sonnemans, R.; Berry, I.; Waldfried, C.; Mattson, D.; DeLuca, J.; Vereecke, G.; Mertens, P. W.; Parac-Vogt, T. N.; Heyns, M. M.
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Characterization of post-etched photoresist and residues by various analytical techniques
err2008-12-01
err4
PREAI
errFranquet, A.; Claes, M.; Conard, T.; Kesters, E.; Vereecke, G.; Vandervorst, W.
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Bulk properties of MOCVD-deposited HfO2 layers fair high k dielectric applications
err2004-01-01
err12
PREAI
errVan Elshocht, S; Baklanov, M; Brijs, B; Carter, R; Caymax, M; Carbonell, L; Claes, M; Conard, T; Cosnier, V; Daté, L; De Gendt, S; Kluth, J; Pique, D; Richard, O; Vanhaeren, D; Vereecke, G; Witters, T; Zhao, C; Heyns, M
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Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence
err2001-11-01
err4
PREAI
errVereecke, G; Arnauts, S; Van Doorne, P; Kenis, K; Onsia, B; Verstraeten, K; Schaekers, M; Van Hoeymissen, JAB; Heyns, MM
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