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SaveImpact of La-OH bonds on the retention of Co/LaSiO CBRAM
Radhakrishnan, J.; Belmonte, A.; Nyns, L.; Devulder, W.; Vereecke, G.; Donadio, G. L.; Kumbhare, P.; Delhougne, R.; Houssa, M.; Kar, G. S.; Goux, L.
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SaveIn-situ ATR-FTIR for dynamic analysis of superhydrophobic breakdown on nanostructured silicon surfaces
Vrancken, Nandi; Li, Jiaqi; Sergeant, Stefanie; Vereecke, Guy; Doumen, Geert; Holsteyns, Frank; Chen, Chang; Terryn, Herman; De Gendt, Stefan; Xu, XiuMei
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SaveFull wetting of plasmonic nanopores through two-component droplets
Chen, Chang; Xu, XiuMei; Li, Yi; Jans, Hilde; Neutens, Pieter; Kerman, Sarp; Vereecke, Guy; Holsteyns, Frank; Maes, Guido; Lagae, Liesbet; Stakenborg, Tim; van Dorpe, Pol
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SaveHigh-Frequency Acoustic for Nanostructure Wetting Characterization
Li, Sizhe; Lamant, Sebastien; Carlier, Julien; Toubal, Malika; Campistron, Pierre; Xu, Xiumei; Vereecke, Guy; Senez, Vincent; Thomy, Vincent; Nongaillard, Bertrand
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SaveCapturing Wetting States in Nanopatterned Silicon
Xu, XiuMei; Vereecke, Guy; Chen, Chang; Pourtois, Geoffrey; Armini, Silvia; Verellen, Niels; Tsai, Wei-Kang; Kim, Dong-Wook; Lee, Eunsongyi; Lin, Chang-You; Van Dorpe, Pol; Struyf, Herbert; Holsteyns, Frank; Moshchalkov, Victor; Indekeu, Joseph; De Gendt, Stefan
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SaveDegradation of 248 nm Deep UV Photoresist by Ion Implantation
Tsvetanova, D.; Vos, R.; Vereecke, G.; Parac-Vogt, T. N.; Clemente, F.; Vanstreels, K.; Radisic, D.; Conard, T.; Franquet, A.; Jivanescu, M.; Nguyen, D. A. P.; Stesmans, A.; Brijs, B.; Mertens, P.; Heyns, M. M.
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SaveRemoval of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent
Tsvetanova, D.; Vos, R.; Vanstreels, K.; Radisic, D.; Sonnemans, R.; Berry, I.; Waldfried, C.; Mattson, D.; DeLuca, J.; Vereecke, G.; Mertens, P. W.; Parac-Vogt, T. N.; Heyns, M. M.
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SaveBulk properties of MOCVD-deposited HfO2 layers fair high k dielectric applications
Van Elshocht, S; Baklanov, M; Brijs, B; Carter, R; Caymax, M; Carbonell, L; Claes, M; Conard, T; Cosnier, V; Daté, L; De Gendt, S; Kluth, J; Pique, D; Richard, O; Vanhaeren, D; Vereecke, G; Witters, T; Zhao, C; Heyns, M
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