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J

James H. G. Owen

university of geneva

28H-index
140Paper Count
2.3KCitation Count
Published Papers 21
Publication Date
Atomic-precision advanced manufacturing for Si quantum computing
err2021-08-03
err18
errOAAI
errBussmann, Ezra; Butera, Robert E.; Owen, James H. G.; Randall, John N.; Rinaldi, Steven M.; Baczewski, Andrew D.; Misra, Shashank
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Advanced Scanning Probe Nanolithography Using GaN Nanowires
err2021-06-30
err14
PREAI
errBehzadirad, Mahmoud; Mecholdt, Stephan; Randall, John N.; Ballard, Joshua B.; Owen, James; Rishinaramangalam, Ashwin K.; Reum, Alexander; Gotszalk, Teodor; Feezell, Daniel F.; Rangelow, Ivo W.; Busani, Tito
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Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations
err2016-02-01
err18
PREAI
errLongo, R. C.; Owen, J. H. G.; McDonnell, S.; Dick, D.; Ballard, J. B.; Randall, J. N.; Wallace, R. M.; Chabal, Y. J.; Cho, K.
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Ab initio Study of H2 Associative Desorption on Ad-Dimer Reconstructed Si(001) and Ge(001)-(2x1) Surfaces
err2014-05-01
err5
PREAI
errLongo, R. C.; Owen, J. H. G.; McDonnell, S.; Ballard, J. B.; Wallace, R. M.; Randall, J. N.; Chabal, Y. J.; Cho, K.
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Digermane Deposition on Si(100) and Ge(100): from Adsorption Mechanism to Epitaxial Growth
err2013-12-24
err9
PREAI
errDick, Don; Veyan, Jean-Francois; Longo, R. C.; McDonnell, Stephen; Ballard, Josh B.; Qin, Xiaoye; Dong, Hong; Owen, James H. G.; Randall, John N.; Wallace, Robert M.; Cho, Kyeongjae; Chabal, Yves J.
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Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination
err2013-09-19
err79
PREAI
errMcDonnell, Stephen; Longo, Roberto C.; Seitz, Oliver; Ballard, Josh B.; Mordi, Greg; Dick, Don; Owen, James H. G.; Randall, John N.; Kim, Jiyoung; Chabal, Yves J.; Cho, Kyeongjae; Wallace, Robert M.
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Scalable Patterning of One-Dimensional Dangling Bond Rows on Hydrogenated Si(001)
err2013-04-04
err10
PREAI
errBianco, Francois; Bowler, David R.; Owen, James H. G.; Koester, Sigrun A.; Longobardi, Maria; Renner, Christoph
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Si2H6 Dissociative Chemisorption and Dissociation on Si(100)-(2x1) and Ge(100)-(2x1)
err2011-11-29
err8
PREAI
errVeyan, Jean-Francois; Choi, Heesung; Huang, Min; Longo, R. C.; Ballard, Josh B.; McDonnell, Stephen; Nadesalingam, Manori P.; Dong, Hong; Chopra, Irinder S.; Owen, James H. G.; Kirk, Wiley P.; Randall, John N.; Wallace, Robert M.; Cho, Kyeongjae; Chabal, Yves J.
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Endotaxial Si nanolines in Si(001):H
err2011-07-29
err12
errOAAI
errBianco, F.; Owen, J. H. G.; Koester, S. A.; Mazur, D.; Renner, Ch.; Bowler, D. R.
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One-dimensional Si-in-Si(001) template for single-atom wire growth
err2010-08-30
err11
errOAAI
errOwen, J. H. G.; Bianco, F.; Koester, S. A.; Mazur, D.; Bowler, D. R.; Renner, Ch.
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Al nanocluster arrays on Si(111)-7x7 surfaces: Formation process and interactions among clusters
err2007-08-15
err13
PREAI
errLi, Run-Wei; Liu, Hongjun; Owen, J. H. G.; Wakayama, Y.; Miki, K.; Yeom, H. W.
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Dynamic behavior and phase transition of magic Al clusters on Si(111)-7x7 surfaces
err2006-08-18
err15
PREAI
errLi, Run-Wei; Owen, J. H. G.; Kusano, S.; Miki, K.
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In situ threshold photoemission yields correlated to surface reconstructions of InAs (001)
err2001-10-08
err4
PREAI
errZinck, JJ; Ross, RS; Owen, JHG; Barvosa-Carter, W; Grosse, F; Ratsch, C
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Surface reconstructions for InAs(001) studied with density-functional theory and STM
err2000-09-15
err89
PREAI
errRatsch, C; Barvosa-Carter, W; Grosse, F; Owen, JHG; Zinck, JJ
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Atomically perfect bismuth lines on Si(001)
err1999-06-15
err101
PREAI
errMiki, K; Bowler, DR; Owen, JHG; Briggs, GAD; Sakamoto, K
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Diffusion of paired hydrogen on Si(001)
err1998-04-15
err35
PREAI
errBowler, DR; Owen, JHG; Miki, K; Briggs, GAD
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Competing growth mechanisms of Ge/Si(001) coherent clusters
err1997-10-15
err83
PREAI
errGoldfarb, I; Hayden, PT; Owen, JHG; Briggs, GAD
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