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Youngchul Byun

Research Institute of Industrial Science and Technology

21H-index
84Paper Count
1.6KCitation Count
Published Papers 36
Publication Date
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Early Detection of NOx Spikes in Ferroalloy Electric Arc Furnace Plants
errProcess Safety and Environmental Protection
IF7.8
err2025-12-02
err0
PREAI
errSeoin Park; Youngjin Seol; Junhee Lee; Chang-Wan Kim; Youngchul Byun; Seungwan Seo; Janghyeok Yoon
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NaHCO₃ production from Na₂SO₄ carbonation: Dynamic simulation for particle growth and production yield with pilot-scale validation
errChemical Engineering Journal
IF13.2
err2025-11-08
err0
errOAAI
errYoungchul Byun; Parth Shah; Jung Gi Min; Chi Ho Lee; Joseph Sang-Il Kwon
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Comprehensive process for valorization of sodium sulfate byproduct into sodium bicarbonate: Integrated approach toward sustainable battery material production
errChemical Engineering Journal
IF13.2
err2025-09-15
err0
PREAI
errJung Gi Min; Hwan Gi Kim; Wangsoo Kim; Hwabhin Kwon; Seungwan Seo; Youngchul Byun
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Regeneration of sodium bicarbonate from industrial Na-based desulfurization waste using ammonium hydroxide
errJOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY
IF6
err2023-06-01
err8
PREAI
errLee, Donghyun; Yun, Tae Ho; Min, Jung Gi; Byun, Youngchul; Yim, Changyong
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Experimental Study on the Operating Parameters of a Pulse-Jet Filter Bag Cleaning System
errSUSTAINABILITY
IF3.3
err2022-06-14
err0
errOAAI
errKim, Eunae; Byun, Youngchul; Bak, Hyun-Su; Koh, Dong-Jun
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Enhanced SO2 resistance of V2O5/WO3-TiO2 catalyst physically mixed with alumina for the selective catalytic reduction of NOx with NH3
errCHEMICAL ENGINEERING JOURNAL
IF13.2
err2022-04-01
err30
PREAI
errJeon, Se Won; Song, Inhak; Lee, Hwangho; Kim, Joonwoo; Byun, Youngchul; Koh, Dong Jun; Kim, Do Heui
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Simple physical mixing of zeolite prevents sulfur deactivation of vanadia catalysts for NOx removal
errNATURE COMMUNICATIONS
IF15.7
err2021-02-10
err72
errOAAI
errSong, Inhak; Lee, Hwangho; Jeon, Se Won; Ibrahim, Ismail A. M.; Kim, Joonwoo; Byun, Youngchul; Koh, Dong Jun; Han, Jeong Woo; Kim, Do Heui
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High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor
errJOURNAL OF MATERIALS CHEMISTRY C
IF5.1
err2020-01-01
err7
PREAI
errKim, Harrison Sejoon; Hwang, Su Min; Meng, Xin; Byun, Young-Chul; Jung, Yong Chan; Ravichandran, Arul Vigneswar; Sahota, Akshay; Kim, Si Joon; Ahn, Jinho; Lee, Lance; Zhou, Xiaobing; Hwang, Byung Keun; Kim, Jiyoung
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Top-down fabrication of high-uniformity nanodiamonds by self-assembled block copolymer masks
errSCIENTIFIC REPORTS
IF3.9
err2019-05-06
err15
errOAAI
errZheng, Jiabao; Lienhard, Benjamin; Doerk, Gregory; Cotlet, Mircea; Bersin, Eric; Kim, Harrison Sejoon; Byun, Young-Chul; Nam, Chang-Yong; Kim, Jiyoung; Black, Charles T.; Englund, Dirk
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Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2018-11-28
err32
PREAI
errKim, Harrison Sejoon; Meng, Xin; Kim, Si Joon; Lucero, Antonio T.; Cheng, Lanxia; Byun, Young-Chul; Lee, Joy S.; Hwang, Su Min; Kondusamy, Aswin L. N.; Wallace, Robert M.; Goodman, Gary; Wan, Alan S.; Telgenhoff, Michael; Hwang, Byung Keun; Kim, Jiyoung
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Stepped Propane Adsorption in Pure-Silica ITW Zeolite
errLANGMUIR
IF3.9
err2018-04-10
err11
errOAAI
errMin, Jung Gi; Luna-Triguero, Azahara; Byun, Youngchul; Balestra, Salvador R. G.; Manuel Vicent-Luna, Jose; Calero, Sofia; Hong, Suk Bong; Camblor, Miguel A.
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Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane
errACS APPLIED MATERIALS & INTERFACES
IF8.2
err2018-03-17
err28
PREAI
errMeng, Xin; Kim, Harrison Sejoon; Lucero, Antonio T.; Hwang, Su Min; Lee, Joy S.; Byun, Young-Chul; Kim, Jiyoung; Hwang, Byung Keun; Zhou, Xiaobing; Young, Jeanette; Telgenhoff, Michael
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Large ferroelectric polarization of TiN/Hf0.5Zr0.5O2 capacitors due to stress-induced crystallization at low budget
errAPPLIED PHYSICS LETTERS
IF3.6
err2017-12-12
err272
PREAI
errKim, Si Joon; Narayan, Dushyant; Lee, Jae-Gil; Mohan, Jaidah; Lee, Joy S.; Lee, Jaebeom; Kim, Harrison S.; Byun, Young-Chul; Lucero, Antonio T.; Young, Chadwin D.; Summerfelt, Scott R.; San, Tamer; Colombo, Luigi; Kim, Jiyoung
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Comparative study of trimethylaluminum and tetrakis(dimethylamido)titanium pretreatments on Pd/Al2O3/p-GaSb capacitors
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2017-09-19
err2
PREAI
errAn, Youngseo; Lee, Changmin; Choi, Sungho; Song, Jeongkeun; Byun, Young-Chul; Park, Dambi; Kim, Jiyoung; Cho, Mann-Ho; Kim, Hyoungsub
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Effects of H2 High-pressure Annealing on HfO2/Al2O3/In0.53Ga0.47As Capacitors: Chemical Composition and Electrical Characteristics
errSCIENTIFIC REPORTS
IF3.9
err2017-08-29
err8
errOAAI
errChoi, Sungho; An, Youngseo; Lee, Changmin; Song, Jeongkeun; Manh-Cuong Nguyen; Byun, Young-Chul; Choi, Rino; McIntyre, Paul C.; Kim, Hyoungsub
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Low temperature (100 °C) atomic layer deposited-ZrO2 for recessed gate GaN HEMTs on Si
errAPPLIED PHYSICS LETTERS
IF3.6
err2017-08-24
err14
PREAI
errByun, Young-Chul; Lee, Jae-Gil; Meng, Xin; Lee, Joy S.; Lucero, Antonio T.; Kim, Si Joon; Young, Chadwin D.; Kim, Moon J.; Kim, Jiyoung
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Impurity and silicate formation dependence on O3 pulse time and the growth temperature in atomic-layer-deposited La2O3 thin films
errJOURNAL OF CHEMICAL PHYSICS
IF3.1
err2017-02-03
err6
PREAI
errPark, Tae Joo; Byun, Young-Chul; Wallace, Robert M.; Kim, Jiyoung
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Atomic Layer Deposition of Silicon Nitride Thin Films: A Review of Recent Progress, Challenges, and Outlooks
errMATERIALS
IF3.2
err2016-12-12
err188
errOAAI
errMeng, Xin; Byun, Young-Chul; Kim, Harrison S.; Lee, Joy S.; Lucero, Antonio T.; Cheng, Lanxia; Kim, Jiyoung
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Zeolite-Catalyzed Disproportionation of iso-Propylbenzene: Identification of Reaction Intermediates and Mechanism
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2016-05-19
err4
PREAI
errCha, Seung Hyeok; Lee, Kyounghwan; Byun, Youngchul; Hong, Suk Bong
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n-Propylbenzene Disproportionation: An Efficient Tool for Assessing the Framework Topology of Large-Pore Zeolites
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2016-03-14
err7
PREAI
errByun, Youngchul; Cha, Seung Hyeok; Jeon, Hong Joo; Hong, Suk Bong
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Research Directions

No research directions
Co-authors
Cooperation Journals
R
Robert M. Wallace
H-index: 91 · Papers: 621
邓
邓风 (Feng Deng)
H-index: 85 · Papers: 628
D
Dirk Englund
H-index: 85 · Papers: 997
M
Moon J. Kim
H-index: 78 · Papers: 441
郑
郑安民 (Anmin Zheng)
H-index: 75 · Papers: 452
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