Not logged inN-Type Behavior from a P-Type Dopant: Charge Compensation Mechanisms in Trivalent Y-Doped HfO2
Rehm, Oliver; Baumgarten, Lutz; Wunderwald, Florian; Fuhrberg, Andreas; During, Pia Maria; Gloskovskii, Andrei; Schlueter, Christoph; Mikolajick, Thomas; Schroeder, Uwe; Muller, Martina .png)
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SaveShare Save Correct quantification of oxygen vacancies in ferroelectric hafniaPerez Ramirez, L.; Iung, T.; Yadav, V.; Lubin, C.; Schroeder, U.; Wunderwald, F.; Azevedo Antunes, L.; Kersch, A.; Back, T. C.; Weiland, C.; Gros-Jean, M.; Barrett, N. Share Save Share Save Share Save Impact of Hafnium Doping on Phase Transition, Interface, and Reliability Properties of Zr x Hf1-x O2-Based CapacitorsVishnumurthy, Pramoda; Xu, Bohan; Wunderwald, Florian; Richter, Claudia; Rehm, Oliver; Baumgarten, Lutz; Mueller, Martina; Mikolajick, Thomas; Kersch, Alfred; Schroeder, Uwe Share Save Share Save Share Save Share Save Share Save Share Save Electrically induced cancellation and inversion of piezoelectricity in ferroelectric Hf0.5Zr0.5O2Lu, Haidong; Kim, Dong-Jik; Aramberri, Hugo; Holzer, Marco; Buragohain, Pratyush; Dutta, Sangita; Schroeder, Uwe; Deshpande, Veeresh; Iniguez, Jorge; Gruverman, Alexei; Dubourdieu, Catherine Share Save Share Save Strain as a Global Factor in Stabilizing the Ferroelectric Properties of ZrO2Xu, Bohan; Lomenzo, Patrick D.; Kersch, Alfred; Schenk, Tony; Richter, Claudia; Fancher, Chris M.; Starschich, Sergej; Berg, Fenja; Reinig, Peter; Holsgrove, Kristina M.; Kiguchi, Takanori; Mikolajick, Thomas; Boettger, Ulrich; Schroeder, Uwe Share Save Share Save Roadmap on ferroelectric hafnia- and zirconia-based materials and devicesSilva, Jose P. B.; Alcala, Ruben; Avci, Uygar E.; Barrett, Nick; Begon-Lours, Laura; Borg, Mattias; Byun, Seungyong; Chang, Sou-Chi; Cheong, Sang-Wook; Choe, Duk-Hyun; Coignus, Jean; Deshpande, Veeresh; Dimoulas, Athanasios; Dubourdieu, Catherine; Fina, Ignasi; Funakubo, Hiroshi; Grenouillet, Laurent; Gruverman, Alexei; Heo, Jinseong; Hoffmann, Michael; Hsain, H. Alex; Huang, Fei-Ting; Hwang, Cheol Seong; Iniguez, Jorge; Jones, Jacob L.; Karpov, Ilya V.; Kersch, Alfred; Kwon, Taegyu; Lancaster, Suzanne; Lederer, Maximilian; Lee, Younghwan; Lomenzo, Patrick D.; Martin, Lane W.; Martin, Simon; Migita, Shinji; Mikolajick, Thomas; Noheda, Beatriz; Park, Min Hyuk; Rabe, Karin M.; Salahuddin, Sayeef; Sanchez, Florencio; Seidel, Konrad; Shimizu, Takao; Shiraishi, Takahisa; Slesazeck, Stefan; Toriumi, Akira; Uchida, Hiroshi; Vilquin, Bertrand; Xu, Xianghan; Ye, Kun Hee; Schroeder, Uwe Share Save Share Save The Electrode-Ferroelectric Interface as the Primary Constraint on Endurance and Retention in HZO-Based Ferroelectric CapacitorsAlcala, Ruben; Materano, Monica; Lomenzo, Patrick D.; Vishnumurthy, Pramoda; Hamouda, Wassim; Dubourdieu, Catherine; Kersch, Alfred; Barrett, Nicolas; Mikolajick, Thomas; Schroeder, Uwe Share Save Share Save Share Save 
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