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J

John N. Randall

zyvex corporation

27H-index
188Paper Count
3.6KCitation Count
Published Papers 17
Publication Date
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Deep learning for electron and scanning probe microscopy: From materials design to atomic fabrication
errMRS BULLETIN
IF4.9
err2022-11-03
err21
errOAAI
errKalinin, Sergei, V; Ziatdinov, Maxim; Spurgeon, Steven R.; Ophus, Colin; Stach, Eric A.; Susi, Toma; Agar, Josh; Randall, John
errShare
errSave
Atomic-precision advanced manufacturing for Si quantum computing
errMRS BULLETIN
IF4.9
err2021-08-03
err18
errOAAI
errBussmann, Ezra; Butera, Robert E.; Owen, James H. G.; Randall, John N.; Rinaldi, Steven M.; Baczewski, Andrew D.; Misra, Shashank
errShare
errSave
Advanced Scanning Probe Nanolithography Using GaN Nanowires
errNANO LETTERS
IF9.1
err2021-06-30
err14
PREAI
errBehzadirad, Mahmoud; Mecholdt, Stephan; Randall, John N.; Ballard, Joshua B.; Owen, James; Rishinaramangalam, Ashwin K.; Reum, Alexander; Gotszalk, Teodor; Feezell, Daniel F.; Rangelow, Ivo W.; Busani, Tito
errShare
errSave
Scanning Tunneling Microscope Control: A Self-Tuning PI Controller Based on Online Local Barrier Height Estimation
errIEEE TRANSACTIONS ON CONTROL SYSTEMS TECHNOLOGY
IF3.9
err2019-09-01
err24
PREAI
errTajaddodianfar, Farid; Moheimani, S. O. Reza; Randall, John N.
errShare
errSave
Toward Selective Ultra-High-Vacuum Atomic Layer Deposition of Metal Oxides on Si(100)
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2016-10-17
err20
PREAI
errDick, Don; Ballard, Joshua B.; Longo, R. C.; Randall, John N.; Cho, Kyeongjae; Chabal, Yves J.
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errSave
Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2016-02-01
err18
PREAI
errLongo, R. C.; Owen, J. H. G.; McDonnell, S.; Dick, D.; Ballard, J. B.; Randall, J. N.; Wallace, R. M.; Chabal, Y. J.; Cho, K.
errShare
errSave
Ab initio Study of H2 Associative Desorption on Ad-Dimer Reconstructed Si(001) and Ge(001)-(2x1) Surfaces
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2014-05-01
err5
PREAI
errLongo, R. C.; Owen, J. H. G.; McDonnell, S.; Ballard, J. B.; Wallace, R. M.; Randall, J. N.; Chabal, Y. J.; Cho, K.
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errSave
Digermane Deposition on Si(100) and Ge(100): from Adsorption Mechanism to Epitaxial Growth
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2013-12-24
err9
PREAI
errDick, Don; Veyan, Jean-Francois; Longo, R. C.; McDonnell, Stephen; Ballard, Josh B.; Qin, Xiaoye; Dong, Hong; Owen, James H. G.; Randall, John N.; Wallace, Robert M.; Cho, Kyeongjae; Chabal, Yves J.
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errSave
Controlling the Atomic Layer Deposition of Titanium Dioxide on Silicon: Dependence on Surface Termination
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2013-09-19
err79
PREAI
errMcDonnell, Stephen; Longo, Roberto C.; Seitz, Oliver; Ballard, Josh B.; Mordi, Greg; Dick, Don; Owen, James H. G.; Randall, John N.; Kim, Jiyoung; Chabal, Yves J.; Cho, Kyeongjae; Wallace, Robert M.
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errSave
Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography
errNATURE COMMUNICATIONS
IF15.7
err2012-07-03
err49
errOAAI
errSchmucker, S. W.; Kumar, N.; Abelson, J. R.; Daly, S. R.; Girolami, G. S.; Bischof, M. R.; Jaeger, D. L.; Reidy, R. F.; Gorman, B. P.; Alexander, J.; Ballard, J. B.; Randall, J. N.; Lyding, J. W.
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errSave
Patterning of sub-1 nm dangling-bond lines with atomic precision alignment on H:Si(100) surface at room temperature
errnanotechnology
IF2.8
err2012-06-19
err12
PREAI
errChen, S.; Xu, H.; Goh, K. E. J.; Liu, Lerwen; Randall, J. N.
errShare
errSave
Si2H6 Dissociative Chemisorption and Dissociation on Si(100)-(2x1) and Ge(100)-(2x1)
errJOURNAL OF PHYSICAL CHEMISTRY C
IF3.2
err2011-11-29
err8
PREAI
errVeyan, Jean-Francois; Choi, Heesung; Huang, Min; Longo, R. C.; Ballard, Josh B.; McDonnell, Stephen; Nadesalingam, Manori P.; Dong, Hong; Chopra, Irinder S.; Owen, James H. G.; Kirk, Wiley P.; Randall, John N.; Wallace, Robert M.; Cho, Kyeongjae; Chabal, Yves J.
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errSave
Using patterned H-resist for controlled three-dimensional growth of nanostructures
errAPPLIED PHYSICS LETTERS
IF3.6
err2011-04-18
err12
PREAI
errGoh, K. E. J.; Chen, S.; Xu, H.; Ballard, J.; Randall, J. N.; Von Ehr, J. R.
errShare
errSave
Fabrication of high-density nanostructures with an atomic force microscope
errAPPLIED PHYSICS LETTERS
IF3.6
err2004-02-23
err20
PREAI
errLiu, JF; Von Ehr, JR; Baur, C; Stallcup, R; Randall, J; Bray, K
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errSave
Functional InP/InGaAs lateral double barrier heterostructure resonant tunneling diodes by using etch and regrowth
errAPPLIED PHYSICS LETTERS
IF3.6
err1996-09-23
err2
PREAI
errBroekaert, TPE; Randall, JN; Beam, EA; Jovanovic, D; Seabaugh, AC; Smith, BD
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errSave
Electron-spectroscopic study of vertical In1-xGaxAs quantum dots
errPHYSICAL REVIEW B
IF3.7
err1996-06-15
err15
PREAI
errSleight, JW; Hornbeck, ES; Deshpande, MR; Wheeler, RG; Reed, MA; Bowen, RC; Frensley, WR; Randall, JN; Matyi, RJ
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errSave
RESONANT TUNNELING QUANTUM-DOT DIODES - PHYSICS, LIMITATIONS, AND TECHNOLOGICAL PROSPECTS
errPROCEEDINGS OF THE IEEE
IF25.9
err1991-01-01
err9
PREAI
errLUSCOMBE, JH; RANDALL, JN; BOUCHARD, AM
errShare
errSave

Research Directions

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Co-authors
Cooperation Journals
S
Sergei V. Kalinin
H-index: 109 · Papers: 1.6K
Y
Yves J. Chabal
H-index: 101 · Papers: 631
E
Eric A. Stach
H-index: 95 · Papers: 856
R
Robert M. Wallace
H-index: 91 · Papers: 622
K
Kyeongjae Cho
H-index: 87 · Papers: 574
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