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Tobinc, PJ
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Thermal stability and electrical characterization of HfO2 films on thermally nitrided Si
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
IF
3.3
2004-01-01
6
PRE
AI
Bastos, KP; Morais, J; Miotti, L; Soares, GV; Pezzi, RP; da Silva, RCG; Boudinov, H; Baumvol, IJR; Hegde, RI; Tseng, HH; Tobinc, PJ
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Co-authors
Cooperation Journals
R
R. P. Pezzi
H-index: 59 · Papers: 436
J
Jonder Morais
H-index: 35 · Papers: 186
R
R. I. Hegde
H-index: 28 · Papers: 93
H
H.‐H. Tseng
H-index: 26 · Papers: 88
H
H. Boudinov
H-index: 21 · Papers: 162
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