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J

Julian Schulze

ruhr university bochum

54H-index
487Paper Count
9.0KCitation Count
Published Papers 181
Publication Date
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Magnetically induced formation and disruption of striations in capacitively coupled radio-frequency CF4 plasmas
errPlasma Sources Science and Technology
IF3.3
err2026-04-29
err0
errOAAI
errLi Wang; Aranka Derzsi; Peter Hartmann; Zoltán Donkó; Maximilian Ryppa; Constantin Neuroth; Florian Beckfeld; Wan Dong; Yuan-Hong Song; Julian Schulze
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Atomic layer etching of sputter-deposited AlN thin films in radiofrequency Cl2–Ar plasmas
errPlasma Sources Science and Technology
IF3.3
err2026-04-09
err0
errOAAI
errIurii Nesterenko; Joaquín Miranda-Mena; Benjamin Kalas; Dmytro Solonenko; Jon Farr; Steffen Harzenetter; Thang Duy Dao; Julian Schulze; Nikolai Andrianov
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Effects of RF bias phase on plasma characteristics in an inductively coupled plasma
errPlasma Sources Science and Technology
IF3.3
err2026-02-24
err0
PREAI
errZhaoyu Chen; Zili Chen; Yu Wang; Hongyu Wang; Wei Jiang; Yonghua Ding; Donghui Xia; Julian Schulze; Xixuan Chen; Ya Zhang
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Computational investigations of impedance matching for pulsed capacitively coupled plasmas
errPlasma Sources Science and Technology
IF3.3
err2026-02-10
err0
PREAI
errShimin Yu; Zili Chen; Yu Wang; Zhipeng Chen; Zhijiang Wang; Wei Jiang; Ya Zhang; Julian Schulze
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Similarity scaling for low-pressure capacitive radio-frequency CF4 plasmas across operation modes
errPhysical Review E
IF2.4
err2026-02-09
err1
PREAI
errZhou, Zhenhua; Wang, Xiaokun; Li, Hanyang; Schulze, Julian; Hartmann, Peter; Donko, Zoltan; Liu, Yongxin; Fu, Yangyang
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Ion-ion oscillation and periodic emission pattern in electronegative capacitively coupled radio frequency plasmas
errPhysics of Plasmas
IF2.2
err2026-02-01
err0
PREAI
errWang, Tianhong; Rauf, Shahid; Friedrichs, Niklas; Korolov, Ihor; Kenney, Jason; Schulze, Julian
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Effects of inductive and capacitive bias power on plasma parameters in inductively coupled radio frequency discharges
errJournal of Physics D: Applied Physics
IF3.2
err2026-01-13
err0
PREAI
errXiandi Li; Zhaoyu Chen; Zili Chen; Li Wang; Yu Wang; Zhipeng Chen; Hongyu Wang; Wei Jiang; Julian Schulze; Ya Zhang
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Two-dimensional spatially resolved measurements of helium metastable densities by tunable diode laser absorption spectroscopy in atmospheric pressure RF plasma jets
errReview of Scientific Instruments
IF1.7
err2026-01-01
err0
PREAI
errSchulenberg, David A.; Wang, Xiao-Kun; Vass, Mate; Korolov, Ihor; Mussenbrock, Thomas; Schulze, Julian
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Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
errPlasma Sources Science and Technology
IF3.3
err2025-11-28
err0
errOAAI
errJonas Giesekus; Anton Pletzer; Florian Beckfeld; Katharina Noesges; Claudia Bock; Julian Schulze
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Plasma asymmetry effects induced by inter-electrode thermal gradients in capacitively coupled radio frequency plasmas
errPlasma Sources Science and Technology
IF3.3
err2025-11-17
err0
PREAI
errXing-Yu Li; Quan-Zhi Zhang; Julian Schulze; You-Nian Wang
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Spatial structure of a radio-frequency magnetron plasma at various Ar gas pressures for hydrophobic film preparation with a fluoropolymer PFA target
errVacuum
IF3.9
err2025-11-06
err0
errOAAI
errYasunori Ohtsu; Ryohei Kuno; Takeshi Yasunaga; Julian Schulze
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Synergistic control of radical generation in a radio-frequency atmospheric-pressure plasma jet via voltage waveform tailoring and structured electrodes
errJournal of Physics D: Applied Physics
IF3.2
err2025-10-13
err0
PREAI
errMáté Vass; Xiaokun Wang; Ihor Korolov; Julian Schulze; Thomas Mussenbrock
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Simulation study of mode transitions induced by external control parameters in capacitively coupled oxygen discharges
errPlasma Sources Science and Technology
IF3.3
err2025-09-25
err0
PREAI
errChong-Biao Tian; Li Wang; Máté Vass; Xiao-Kun Wang; Wan Dong; Yuan-Hong Song; Julian Schulze
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Nonlocal electron dynamics in low pressure miniature inductively coupled radio frequency discharges
errPlasma Sources Science and Technology
IF3.3
err2025-09-18
err0
PREAI
errHui Wen; Fang-Fang Ma; Julian Schulze; Quan-Zhi Zhang
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Dynamics of electron power absorption in capacitive radio-frequency CF4 plasmas operating in the striation mode
errplasma sources science technology
IF0
err2025-08-29
err0
errOAAI
errZhenhua Zhou; Xiaokun Wang; Hanyang Li; Dong Yang; Wenjin Zhang; Julian Schulze; Peter Hartmann; Zoltán Donkó; Yongxin Liu; Yangyang Fu
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Unified mechanism of sub-mode transitions and bistability induced by electron–sheath interactions in capacitively coupled plasmas
errplasma sources science technology
IF0
err2025-08-26
err0
PREAI
errJianxiong Yao; Zeduan Zhang; Quan-Zhi Zhang; Julian Schulze; Yangyang Fu; Kai Zhao; Feng He; Jinsong Miao; Jiting Ouyang; Bocong Zheng
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Oscillations in capacitively coupled plasmas induced by nonlinear coupling between the plasma and its external circuit
errplasma sources science technology
IF0
err2025-07-24
err0
PREAI
errDehen Cao; Shimin Yu; Jingwen Xu; Wei Jiang; Julian Schulze; Ya Zhang
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errSave
Electron power absorption dynamics and uniformity control in capacitive RF plasmas driven by planar segmented electrodes
errplasma sources science technology
IF0
err2025-07-08
err0
PREAI
errLi Wang; Peter Hartmann; Zoltán Donkó; Yuan-Hong Song; Julian Schulze
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Impact of inductively coupled plasma injection on capacitively coupled plasma with a ring-shaped hollow cathode using methane and hydrogen mixture gases
errVACUUM
IF3.9
err2025-07-01
err0
PREAI
errOhtsu, Yasunori; Tabaru, Tatsuo; Schulze, Julian
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Multiscale Simulation of Capacitively Coupled Ar/CHF3 Discharges Driven by Sawtooth-Tailored Voltage Waveforms
errPLASMA PROCESSES AND POLYMERS
IF2.9
err2025-04-20
err0
PREAI
errWan Dong; Liu-Qin Song; Yi-Fan Zhang; Li Wang; Yuan-Hong Song; Julian Schulze
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Research Directions

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Co-authors
Cooperation Journals
Κ
Κ. Peters
H-index: 167 · Papers: 3.9K
杨
杨旸 (Y. Yang)
H-index: 162 · Papers: 2.9K
N
N. Berger
H-index: 156 · Papers: 3.4K
刘鲲 cover
刘鲲 (K. Liu)
H-index: 136 · Papers: 2.8K
J
J. S. Lange
H-index: 126 · Papers: 2.0K
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