Not logged inFerroelectric Compensation Effect of the Hard Electrode for the HfO2-ZrO2 Superlattice Films at the Low-Annealing Temperature
Zhu, CQ; Bai, N; Wang, YF; Sun, HJ; Zou, LQ; Yi, YH; Xu, JY; Ren, JW; Zhang, JM; Hu, S; Xue, KH; Ye, L; Cheng, WM; He, Q; Miao, XS .png)
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