Asm International

学者数101

论文数73

被引数53

关联论文 (73)

发表时间

ALUMINAIRE HOUSE LIVES ANEW IN PALM SPRINGS ALUMINAIRE HOUSE 在棕榈泉获得新生

ADVANCED MATERIALS & PROCESSES

IF0.2

2026-05-01

PREAI

Chavez, Hallie; Hogue, Frauke

ALUMINAIRE HOUSE LIVES ANEW IN PALM SPRINGS 铝光灯具厂在棕榈泉焕发新生

ADVANCED MATERIALS & PROCESSES

IF0.2

2026-05-01

PREAI

Chavez, Hallie; Hogue, Frauke

Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High-k Rutile Capacitors 金属二氧化钼薄膜的原子层沉积技术实现高介电常数金红石电容器

Advanced Materials Interfaces

IF4.4

2026-04-01

OAAI

Ganzhinov, Alexey; Mattinen, Miika; Vehkamaki, Marko; Mizohata, Kenichiro; Chundak, Mykhailo; Popov, Georgi; Porri, Paavo; Ritala, Mikko; Putkonen, Matti

Interface Engineering Suppresses Self-Annealing in Electroplated Nanograined Copper for Low-Temperature Copper-to-Copper Bonding 界面工程抑制了电镀纳米铜的自退火，以实现低温铜与铜的键合

ADVANCED SCIENCE

IF14.1

2026-01-01

OAAI

Peng, Gangqiang; Dong, Xinyi; Li, Binzhao; He, Chuan; Chen, Cong; Huang, Licheng; Liu, Jian; Zhou, Yonghan; Li, Qikai; Gong, Hao; Wang, Yuechen; Mu, Kaiyu; Cherng, Sheng-Jye; Yang, Po-Yen; Lu, Yang; Yang, Yong; Hung, Shih-Wei; Feng, Shien-Ping

Area-Selective Etching of Poly(lactic acid) Films via Catalytic Hydrogenolysis and Cracking 通过催化氢解和裂化对聚乳酸薄膜进行区域选择性蚀刻

CHEMISTRY OF MATERIALS

IF7

2024-11-26

OAAI

Lasonen, Valtteri; Rajamaki, Viivi; Chundak, Mykhailo; Tois, Eva; Hietala, Sami; Ritala, Mikko

Low-Temperature Dechlorosilylation Chemistry for Area-Selective Deposition of Ge2Sb2Te5 and Its Mechanism in Nanopatterns

CHEMISTRY OF MATERIALS

IF7

2024-06-11

PREAI

Sinha, Jyoti; Gallis, Leonidas; Clerix, Jan-Willem J.; van der Veen, Marleen; Innocent, Jerome; Illiberi, Andrea; Givens, Michael; Nyns, Laura; Delabie, Annelies

Enhancing dielectric passivation on monolayer WS2 via a sacrificial graphene oxide seeding layer

NPJ 2D MATERIALS AND APPLICATIONS

IF8.8

2024-03-27

OAAI

Wyndaele, P. -J.; De Marneffe, J. -F.; Sergeant, S.; De La Rosa, C. J. L.; Brems, S.; Caro, A. M.; De Gendt, S.

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition 通过催化分解对聚甲基丙烯酸甲酯薄膜进行区域选择性蚀刻

CHEMISTRY OF MATERIALS

IF7

2023-07-22

OAAI

Lasonen, Valtteri; Vihervaara, Anton; Popov, Georgi; Tois, Eva; Mester, Lars; Karimi, Mohammad; Ilarionova, Yoana; Jam, Reza Jafari; Sundqvist, Jonas; Ritala, Mikko

Synthesis of Micron-Sized WS2 Crystallites Using Atomic Layer Deposition and Sulfur Annealing

CHEMISTRY OF MATERIALS

IF7

2023-06-09

PREAI

Mullapudi, Kamesh; Addou, Rafik; Dezelah, Charles. L.; Moser, Daniel F.; Kanjolia, Ravindra K.; Woodruff, Jacob H.; Conley Jr, John. F.

About the New Editor-in-Chief

JOURNAL OF THERMAL SPRAY TECHNOLOGY

IF3.3

2023-02-28

PREAI

Cibella, Marc

Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal β-Diketonate Precursors

CHEMISTRY OF MATERIALS

IF7

2022-09-05

PREAI

Zhang, Chao; Tois, Eva; Leskelae, Markku; Ritala, Mikko

Theory and Original Design of Resistive-Inductive Network High-Pass Negative Group Delay Integrated Circuit in 130-nm CMOS Technology

IEEE ACCESS

IF3.6

2022-01-01

OAAI

Guerin, Mathieu; Rahajandraibe, Wenceslas; Fontgalland, Glauco; Silva, Hugerles S.; Chan, George; Wan, Fayu; Thakur, Preeti; Thakur, Atul; Frnda, Jaroslav; Ravelo, Blaise

Ambipolar Gate Modulation Technique for the Reduction of Offset and Flicker Noise in Graphene Hall-Effect Sensors

IEEE SENSORS JOURNAL

IF4.5

2021-11-15

PREAI

Polley, Arup; Ravichandran, Arul Vigneswar; Kumar, Varun S.; Venugopal, Archana; Cheng, Lanxia; Lucero, Antonio T.; Kim, Jiyoung; Colombo, Luigi; Doering, Robert R.

Combining Experimental and DFT Investigation of the Mechanism Involved in Thermal Etching of Titanium Nitride Using Alternate Exposures of NbF5 and CCl4, or CCl4 Only

ADVANCED MATERIALS INTERFACES

IF4.4

2021-10-22

PREAI

Sharma, Varun; Natarajan, Suresh Kondati; Elliott, Simon D.; Blomberg, Tom; Haukka, Suvi; Givens, Michael E.; Tuominen, Marko; Ritala, Mikko

Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure

LANGMUIR

IF3.9

2021-10-20

PREAI

Vervuurt, R. H. J.; Mukherjee, B.; Nakane, K.; Tsutsumi, T.; Hori, M.; Kobayashi, N.

Thermal Atomic Layer Etching of Aluminum Oxide (Al2O3) Using Sequential Exposures of Niobium Pentafluoride (NbF5) and Carbon Tetrachloride (CCl4): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism

CHEMISTRY OF MATERIALS

IF7

2021-04-09

OAAI

Sharma, Varun; Elliott, Simon D.; Blomberg, Tom; Haukka, Suvi; Givens, Michael E.; Tuominen, Marko; Ritala, Mikko

Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl2)亚硫酰氯 (SOCl2) 对氮化钛 (TiN) 的热气相蚀刻

APPLIED SURFACE SCIENCE

IF6.9

2021-02-01

OAAI

Sharma, Varun; Blomberg, Tom; Haukka, Suvi; Cembella, Shaun; Givens, Michael E.; Tuominen, Marko; Odedra, Rajesh; Graff, Wes; Ritala, Mikko

Bandpass Negative Group Delay Theory of Fully Capacitive Δ-Network

IEEE ACCESS

IF3.6

2021-01-01

OAAI

Wan, Fayu; Liu, Yang; Nebhen, Jamel; Xu, Zhifei; Chan, George; Lallechere, Sebastien; Vauche, Remy; Rahajandraibe, Wenceslas; Ravelo, Blaise

Bandpass NGD TAN of Symmetric H-Tree With Resistorless Lumped-Network

IEEE ACCESS

IF3.6

2021-01-01

OAAI

Ravelo, Blaise; Wan, Fayu; Nebhen, Jamel; Chan, George; Rahajandraibe, Wenceslas; Lallechere, Sebastien

Design and Synthesis of Inductorless Passive Cell Operating as Stop-Band Negative Group Delay Function

IEEE ACCESS

IF3.6

2021-01-01

OAAI

Guerin, Mathieu; Liu, Yang; Douyere, Alexandre; Chan, George; Wan, Fayu; Lallechere, Sebastien; Rahajandraibe, Wenceslas; Ravelo, Blaise