Bing‐Yue Tsui - Publications, H-index & Citations

Bing‐Yue Tsui

National Yang Ming Chiao Tung University

24H指数

234论文数

2.1K被引数

收录论文 17

发表时间

Fast I–V Characterization System with Expanded Application Range Featuring 25 V Sub-10 ns Gate Drive and 10 ns Current Measurement Capability 具有25 V亚10 ns门极驱动和10 ns电流测量能力的快速I–V特性测试系统

IEEE Transactions on Instrumentation and Measurement

IF5.9

2026-09-22

PREAI

Yu-Xin Wen; Bing-Yue Tsui; Kin P. Cheung

Defect Inspection Techniques in SiC SiC中的缺陷检测技术

NANOSCALE RESEARCH LETTERS

IF4.1

2022-03-04

OAAI

Chen, Po-Chih; Miao, Wen-Chien; Ahmed, Tanveer; Pan, Yi-Yu; Lin, Chun-Liang; Chen, Shih-Chen; Kuo, Hao-Chung; Tsui, Bing-Yue; Lien, Der-Hsien

Well-behaved Ge n+/p shallow junction achieved by plasma immersion ion implantation

VACUUM

IF3.9

2020-10-01

PREAI

Chen, Yi-Ju; Liao, Hsiu-Hsien; Tsui, Bing-Yue; Lee, Yao-Jen; Wang, Chih-Jen; Sung, Po-Jung

Mechanism of Schottky barrier height modulation by thin dielectric insertion on n-type germanium

APPLIED PHYSICS LETTERS

IF3.6

2013-07-16

OAAI

Tsui, Bing-Yue; Kao, Ming-Hong

Improvement of the Thermal Stability of NiSi by Germanium Ion Implantation

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2010-01-01

OAAI

Tsui, Bing-Yue; Hsieh, Chih-Ming; Hung, Yu-Ren; Yang, York; Shen, Ryan; Cheng, Sam; Lin, Tony

Spatial and energetic distribution of border traps in the dual-layer HfO2/SiO2 high-k gate stack by low-frequency capacitance-voltage measurement

APPLIED PHYSICS LETTERS

IF3.6

2006-10-20

PREAI

Wu, Wei-Hao; Tsui, Bing-Yue; Chen, Mao-Chieh; Hou, Yong-Tian; Jin, Yin; Tao, Hun-Jan; Chen, Shih-Chang; Liang, Mong-Song

Study on the interface thermal stability of metal-oxide-semiconductor structures by inelastic electron tunneling spectroscopy

APPLIED PHYSICS LETTERS

IF3.6

2006-06-30

PREAI

Huang, CF; Tsui, BY; Tzeng, PJ; Lee, LS; Tsai, MJ

Investigation of molybdenum nitride gate on SiO2 and HfO2 for MOSFET application

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2006-01-01

OAAI

Tsui, BY; Huang, CF; Lu, CH

Optimization of back side cleaning process to eliminate copper contamination

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2005-01-01

PREAI

Chou, WY; Tsui, BY; Kuo, CW; Kang, TK

Electrical stability and reliability of ultralow dielectric constant porous carbon-doped oxide film for copper interconnect

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2005-01-01

PREAI

Fang, KL; Tsui, BY

Investigation of Cu/TaN metal gate for metal-oxide-silicon devices (vol 150, pg G22, 2003)

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2003-01-01

OAAI

Tsui, BY; Huang, CF

Investigation of Cu/TaN metal gate for metal-oxide-silicon devices

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2003-01-01

PREAI

Tsui, BY; Huang, CF

Via-filling capability of copper film by CVD

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2003-01-01

OAAI

Lin, CL; Chen, PS; Lin, YC; Tsui, BY; Chen, MC

Dielectric and barrier properties of spin-on organic aromatic low dielectric constant polymers FLARE and SiLK

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2001-01-01

PREAI

Wu, ZC; Shiung, ZW; Wu, RG; Liu, YL; Wu, WH; Tsui, BY; Chen, MC; Chang, W; Chou, PF; Jang, SM; Hu, CH; Liang, MS

Surface-processing-enhanced copper diffusion into fluorosilicate glass

JOURNAL OF THE ELECTROCHEMICAL SOCIETY

IF3.3

2001-01-01

PREAI

Tsui, BY; Fang, KL; Lee, SD

Formation of TiSi2 thin films on stressed (001)Si substrates

APPLIED SURFACE SCIENCE

IF6.9

1999-04-01

PREAI

Cheng, SL; Huang, HY; Peng, YC; Chen, LJ; Tsui, BY; Tsai, CJ; Guo, SS; Yang, YR; Lin, JT

Effects of stress on the growth of TiSi2 thin films on (001)Si

APPLIED PHYSICS LETTERS

IF3.6

1999-03-08

PREAI

Cheng, SL; Huang, HY; Peng, YC; Chen, LJ; Tsui, BY; Tsai, CJ; Guo, SS

研究方向