Armin W. Knoll - Publications, H-index & Citations

Armin W. Knoll

international business machines (ibm)

36H指数

129论文数

5.6K被引数

收录论文 49

发表时间

Control of a Gel-Forming Chemical Reaction Network Using Light-Triggered Proton Pumps

LANGMUIR

IF3.9

2025-03-01

OAAI

da Silva, Jacqueline Figueiredo; Roshanasan, Ardeshir; Bus, Marcel; Fotiadis, Dimitrios; Knoll, Armin W.; van Esch, Jan H.; Wolf, Heiko

Placement of Biological Membrane Patches in a Nanofluidic Gap With Control Over Position and Orientation

ADVANCED MATERIALS INTERFACES

IF4.4

2022-07-19

OAAI

Ruggeri, Francesca; Schwemmer, Christian; Stauffer, Mirko; Nicollier, Philippe M.; Figueiredo da Silva, Jacqueline; Bosshart, Patrick D.; Kochems, Kirstin; Fotiadis, Dimitrios; Knoll, Armin; Wolf, Heiko

Freeform Electronic and Photonic Landscapes in Hexagonal Boron Nitride

NANO LETTERS

IF9.1

2021-09-30

PREAI

Lassaline, Nolan; Thureja, Deepankur; Chervy, Thibault; Petter, Daniel; Murthy, Puneet A.; Knoll, Armin W.; Norris, David J.

Thermal Imaging of Block Copolymers with Sub-10 nm Resolution

ACS NANO

IF16

2021-05-03

PREAI

Gottlieb, Steven; Pigard, Louis; Ryu, Yu Kyoung; Lorenzoni, Matteo; Evangelio, Laura; Fernandez-Regulez, Marta; Rawlings, Colin D.; Spieser, Martin; Perez-Murano, Francesc; Mueller, Marcus; Knoll, Armin W.

Nanometer-Scale-Resolution Multichannel Separation of Spherical Particles in a Rocking Ratchet with Increasing Barrier Heights

PHYSICAL REVIEW APPLIED

IF4.4

2021-03-02

OAAI

Nicollier, Philippe; Schwemmer, Christian; Ruggeri, Francesca; Widmer, Daniel; Ma, Xiaoyu; Knoll, Armin W.

Thermomechanical Nanostraining of Two-Dimensional Materials

NANO LETTERS

IF9.1

2020-10-08

OAAI

Liu, Xia; Sachan, Amit Kumar; Howell, Samuel Tobias; Conde-Rubio, Ana; Knoll, Armin W.; Boero, Giovanni; Zenobi, Renato; Brugger, Jurgen

Deterministic Deposition of Nanoparticles with Sub-10 nm Resolution

NANO LETTERS

IF9.1

2019-11-06

OAAI

Fringes, Stefan; Schwemmer, C.; Rawlings, Colin D.; Knoll, Armin W.

Stabilization and control of topological magnetic solitons via magnetic nanopatterning of exchange bias systems

APPLIED PHYSICS LETTERS

IF3.6

2018-10-15

OAAI

Albisetti, Edoardo; Calo, Annalisa; Spieser, Martin; Knoll, Armin W.; Riedo, Elisa; Petti, Daniela

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer

ACS NANO

IF16

2018-10-12

PREAI

de Marneffe, Jean-Francois; Chan, Boon Teik; Spieser, Martin; Vereecke, Guy; Naumov, Sergej; Vanhaeren, Danielle; Wolf, Heiko; Knoll, Armin W.

Explaining the Transition from Diffusion Limited to Reaction Limited Surface Assembly of Molecular Species through Spatial Variations 通过空间变化解释分子物种从扩散限制到反应限制表面组装的过渡

LANGMUIR

IF3.9

2017-12-29

OAAI

Carroll, Keith M.; Knoll, Armin W.; Wolf, Heiko; Duerig, Urs

Testing the Equivalence between Spatial Averaging and Temporal Averaging in Highly Dilute Solutions

LANGMUIR

IF3.9

2017-12-15

PREAI

Carroll, Keith M.; Rawlings, Colin; Zhang, Yadong; Knoll, Armin W.; Marder, Seth R.; Wolf, Heiko; Duerig, Urs

Control of the interaction strength of photonic molecules by nanometer precise 3D fabrication

SCIENTIFIC REPORTS

IF3.9

2017-11-28

OAAI

Rawlings, Colin D.; Zientek, Michal; Spieser, Martin; Urbonas, Darius; Stoferle, Thilo; Mahrt, Rainer F.; Lisunova, Yuliya; Brugger, Juergen; Duerig, Urs; Knoll, Armin W.

Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography 使用热扫描探针光刻技术在硅中实现10纳米以下的特征尺寸

ACS NANO

IF16

2017-11-01

OAAI

Cho, Yu Kyoung Ryu; Rawlings, Colin D.; Wolf, Heiko; Spieser, Martin; Bisig, Samuel; Reidt, Steffen; Sousa, Marilyne; Khanal, Subarna R.; Jacobs, Tevis D. B.; Knoll, Armin W.

Understanding How Charged Nanoparticles Electrostatically Assemble and Distribute in 1-D

LANGMUIR

IF3.9

2016-12-15

PREAI

Carroll, Keith M.; Wolf, Heiko; Knoll, Armin; Curtis, Jennifer E.; Zhang, Yadong; Marder, Seth R.; Riedo, Elisa; Duerig, Urs

Coherent commensurate electronic states at the interface between misoriented graphene layers 取向错误的石墨烯层之间的界面处的相干相称电子态

NATURE NANOTECHNOLOGY

IF34.9

2016-06-06

125

PREAI