Jon F. Ihlefeld - Publications, H-index & Citations

Jon F. Ihlefeld

University of Virginia

43H指数

336论文数

7.8K被引数

收录论文 130

发表时间

Thermal conductivity and optical phonon scattering of CMOS compatible aluminum nitride based ferroelectric thin films CMOS兼容的铝氮化物基铁电薄膜的热导率和光学声子散射

Nature Communications

IF15.7

2026-09-11

OAAI

Sara Makarem; Ian Mercer; Saman Zare; Michael S. Lafferty; Thomas W. Pfeifer; William Hutchins; Daniel Hirt; Ethan A. Scott; Jon F. Ihlefeld; Susan Trolier-McKinstry; Jon-Paul Maria; Patrick E. Hopkins

Robust Antiferroelectric Response in the Pbca Phase of Hafnium Zirconium Oxide via Aluminum Substitution 通过铝取代在Hafnium Zirconium Oxide的Pbca相中实现稳健的反铁电响应

Journal of the American Ceramic Society

IF3.8

2026-09-06

OAAI

Yong Kyu Choi; MinChul Kang; Tinsae Alem; Nicolas K. Lam; Andrea L. Watson; Kory Burns; Stephen J. McDonnell; Lin Zhou; Jon F. Ihlefeld

Enhanced Ferroelectric Phase Formation via Local Structure Modification in the Pre-Crystalline State of Hafnium Zirconium Oxide Thin Films 通过预结晶状态下氧化铪锆薄膜的局部结构改性增强铁电相形成

Advanced Functional Materials

IF19

2026-09-02

OAAI

Nicolas K. Lam; Gerald R. Bejger; Waseem A. Wani; Kristina M. Holsgrove; Andrew N. Titus; Niyorjyoti Sharma; Shihao Wang; Keithen Orson; Megan K. Lenox; Liron Shvilberg; Yong Kyu Choi; Ian A. Brummel; Benjamin L. Aronson; Petra Reinke; Quentin Ramasse; Amit Kumar; Brian J. Rodriguez; Christina M. Rost; Jon F. Ihlefeld

Electron Energy Loss as a Phase Identification Tool in Hafnium Zirconium Oxide Ferroelectrics 电子能量损失作为氧化铪氧化锆铁电体的相识别工具

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Ece Gunay; Sebastian Calderon; Benjamin Aronson; Jon F Ihlefeld; Elizabeth Dickey

Correlative Nanoscale Spectroscopy and Diffraction of Metastable Phases in Hf0.5Zr0.5O2 Hf0.5Zr0.5O2中准稳相的关联纳米光谱与衍射

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Nooreen T Qureshi; Luke C Johnson; Jordan A Hachtel; Thomas E Beechem; Jon F Ihlefeld; Kory Burns

Investigating Thermal Depolarization and Repolarization of Ferroelectric HZO with In Situ TEM and STEM EBIC 研究铁电HZO的热去极化和再极化现象：原位TEM和STEM EBIC表征

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Tristan P O’Neill; Yueyun Chen; Ho Leung Chan; Megan K Lenox; William A Hubbard; Jon F Ihlefeld; B C Regan

Electrode Grains Template Ferroelectric Domains in a Hafnia-Based Capacitor 电极晶粒在铪基电容器中模板铁电畴

Microscopy and Microanalysis

IF3

2026-07-27

OAAI

Yueyun Chen; Tristan P O’Neill; Ho Leung Chan; Megan K Lenox; William A Hubbard; Jon F Ihlefeld; B C Regan

Ferroelectric Dynamic-Field-Driven Nucleation and Growth Model for Predictive Materials-To-Circuit Co-Design 铁电动态场驱动成核与生长模型用于预测性材料-电路协同设计

Advanced Materials

IF26.8

2026-06-13

OAAI

Yi Liang; Soohyeon Kim; Tony Chiang; Megan K. Lenox; Ian Mercer; John J. Plombon; Jon-Paul Maria; Jon F. Ihlefeld; Wenhao Sun; Wei Lu; John T. Heron

Electrode and Microstructure Dependence of Oxygen Diffusion in Ferroelectric Hafnium Zirconium Oxide Thin Films 铁电氧化铪锆薄膜中氧扩散的电极与微观结构依赖性

Advanced Functional Materials

IF19

2026-05-01

OAAI

Shvilberg, Liron; Pfeifer, Thomas W.; Zhou, Chuanzhen; Choi, Yong Kyu; Choe, Duk-Hyun; Hopkins, Patrick E.; Ihlefeld, Jon F.

Nanoscale Phase Identification Using Two-Dimensional Pair Correlation Functions: A Case Study on Hafnium Oxide 利用二维对关联函数进行纳米尺度相识别：以二氧化铪为例的研究

MICROSCOPY AND MICROANALYSIS

IF3

2025-10-01

OAAI

Calderon, V. S.; Evans, Charles; Jaszewski, Samantha T.; Ihlefeld, Jon F.; Dickey, Elizabeth C.

Environmental Control of Ferroelectricity in Hafnia Films 铪基薄膜铁电性的环境调控

Advanced Materials

IF26.8

2025-08-07

OAAI

Waseem Ahmad Wani; Nicolas K. Lam; Kristina M. Holsgrove; Gerald Bejger; Tinsae Alem; Kory Burns; Stephen J. McDonnell; Christina M. Rost; Amit Kumar; Jon F. Ihlefeld; Brian J. Rodriguez

Electrode Interface Effects in Hafnium Zirconium Oxide Ferroelectrics

Microscopy and Microanalysis

IF3

2025-07-25

PREAI

Ece Gunay; Sebastian Calderon; Benjamin Aronson; Jon Ihlefeld; Elizabeth Dickey

Annealing Optimization for HZO Thin Films with In-Situ STEM EBIC Characterization

Microscopy and Microanalysis

IF3

2025-07-25

PREAI

Yueyun Chen; Ho Leung Chan; Tristan P O’Neill; Megan K Lenox; William A Hubbard; Jon F Ihlefeld; B C Regan

Effect of Precursor Purge Time on Plasma-Enhanced Atomic Layer Deposition-Prepared Ferroelectric Hf0.5Zr0.5O2 Phase and Performance 前驱体吹扫时间对等离子体增强原子层沉积法制备的铁电Hf0.5Zr0.5O2相和性能的影响

ACS OMEGA

IF4.3

2025-05-14

OAAI

Choi, YK; Holsgrove, K; Watson, A; Aronson, BL; Lenox, MK; Shvilberg, L; Zhou, CZ; Fields, SS; Wang, SH; McDonnell, SJ; Kumar, A; Ihlefeld, JF

Modifications in the charge trap landscape in Hf0.5Zr0.5O2 as a function of oxygen vacancy concentration observed with photoemission electron microscopy

APPLIED PHYSICS LETTERS

IF3.6

2025-04-14

PREAI

Vega, Fernando; Boehm, Alex; Kim, Andrew R.; Jaszewski, Samantha; Ohta, Taisuke; Ihlefeld, Jon; Beechem, Thomas

Multistate resistance in TaN/(Hf,Zr)O2/Ta ferroelectric tunnel junctions 多态电阻在TaN/(Hf,Zr)O2/Ta铁电隧穿结中

JOURNAL OF APPLIED PHYSICS

IF2.5

2025-04-14

OAAI

Henry, M. David; Stoltzfus, David; Lenox, Megan K.; Jaszewski, Samantha T.; Young, Travis; Ihlefeld, Jon F.

Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films(vol 124, 252905 , 2024)

APPLIED PHYSICS LETTERS

IF3.6

2025-01-24

PREAI

Shvilberg, Liron; Zhou, Chuanzhen; Lenox, Megan K.; Aronson, Benjamin L.; Lam, Nicolas K.; Jaszewski, Samantha T.; Opila, Elizabeth J.; Ihlefeld, Jon F.

Geometric effects in the measurement of the remanent ferroelectric polarization at the nanoscale

APPLIED PHYSICS LETTERS

IF3.6

2025-01-14

PREAI

Chiang, Tony; Lenox, Megan K.; Ma, Tao; Ihlefeld, Jon F.; Heron, John T.

Conductive filament formation in the failure of Hf0.5Zr0.5O2 ferroelectric capacitors

APL MATERIALS

IF4.5

2025-01-13

OAAI

Webb, Matthew; Chiang, Tony; Lenox, Megan K.; Gray, Jordan; Ma, Tao; Ihlefeld, Jon F.; Heron, John T.

Electrode Elastic Modulus as the Dominant Factor in the Capping Effect in Ferroelectric Hafnium Zirconium Oxide Thin Films 电极弹性模量是铁电铪锆氧化物薄膜覆盖效应的主要因素

ACS APPLIED MATERIALS & INTERFACES

IF8.2

2024-12-03

PREAI

Lenox, Megan K.; Islam, Md Rafiqul; Hoque, Md Shafkat Bin; Skidmore, Chloe H.; Salanova, Alejandro; Fields, Shelby S.; Jaszewski, Samantha T.; Maria, Jon-Paul; Hopkins, Patrick E.; Ihlefeld, Jon F.

研究方向