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Positive Role of Iodine Atoms in Chemically Amplified Photoresists for Extreme Ultraviolet Lithography Ku, Yejin; Park, Han Bit; Kim, Gayoung; Choi, Hyo-Eun; Lee, Jin-Kyun; Lee, Jong-Won; Lee, Sangsul; Kim, Jeongsik; Hur, Myounghyun; Kim, Jaehyun 分享 收藏
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Tin-Oxo Nanocluster Composite Films as Positive-Tone Photoresist for Extreme UV Lithography 锡-氧纳米簇复合薄膜作为正性光刻胶用于极紫外光刻技术 Kim, G; Ku, YJ; Jeon, S; Lee, JK; Lee, SHY; Jung, BJ; Lee, SI; Ryu, C; Park, K; Jung, YL; Jeong, C; Choi, J 分享 收藏
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Solubility Change Behavior of Fluoroalkyl Ether-Tagged Dendritic Hexaphenol under Extreme UV Exposure Oh, Hyun-Taek; Kim, Gayoung; Jung, Seok-Heon; Ku, Yejin; Lee, Jin-Kyun; Kim, Kanghyun; Park, Byeong-Gyu; Lee, Sangsul; Koh, Chawon; Nishi, Tsunehiro; Kim, Hyun-Woo 分享 收藏
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