logo
科言猫学术研究的AI总结
language
手机端手机端
  • Phone Feature微信小程序
简体中文简体中文
notice消息通知
博客博客
delete
arrow
返回
W

Wouter Leroy

Ghent University

19H指数
74论文数
998被引数
收录论文 13
发表时间
logo
Modeling reactive magnetron sputtering: Fixing the parameter set (vol 206, pg 3666, 2012)
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2015-09-01
err3
PREAI
errStrijckmans, K.; Leroy, W. P.; De Gryse, R.; Depla, D.
err分享
err收藏
Study on reactive sputtering of yttrium oxide: Process and thin film properties
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2015-08-01
err46
PREAI
errLei, Pei; Leroy, Wouter; Dai, Bing; Zhu, Jiaqi; Chen, Xiaoting; Han, Jiecai; Depla, Diederik
err分享
err收藏
Momentum transfer driven textural changes of CeO2 thin films
errAPPLIED PHYSICS LETTERS
IF3.6
err2014-09-15
err17
errOAAI
errVan Steenberge, S.; Leroy, W. P.; Hubin, A.; Depla, D.
err分享
err收藏
Influence of the target-substrate distance on the growth of YSZ thin films
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2014-02-01
err4
PREAI
errLamas, Jerika S.; Leroy, Wouter P.; Depla, Diederik
err分享
err收藏
Using the macroscopic scale to predict the nano-scale behavior of YSZ thin films
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2014-01-01
err9
PREAI
errLamas, J. S.; Leroy, W. P.; Lu, Y. -G.; Verbeeck, J.; Van Tendeloo, G.; Depla, D.
err分享
err收藏
Influence of particle and energy flux on stress and texture development in magnetron sputtered TiN films
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2012-12-28
err46
PREAI
errAbadias, G.; Leroy, W. P.; Mahieu, S.; Depla, D.
err分享
err收藏
Modeling reactive magnetron sputtering: Fixing the parameter set
errSURFACE & COATINGS TECHNOLOGY
IF6.1
err2012-04-01
err38
PREAI
errStrijckmans, K.; Leroy, W. P.; De Gryse, R.; Depla, D.
err分享
err收藏
Sputter deposited transition metal nitrides as back electrode for CIGS solar cells
errSOLAR ENERGY
IF6.6
err2011-03-01
err31
errOAAI
errMahieu, S.; Leroy, W. P.; Van Aeken, K.; Wolter, M.; Colaux, J.; Lucas, S.; Abadias, G.; Matthys, P.; Depla, D.
err分享
err收藏
Angular-resolved energy flux measurements of a dc- and HIPIMS-powered rotating cylindrical magnetron in reactive and non-reactive atmosphere
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2011-03-01
err30
errOAAI
errLeroy, W. P.; Konstantinidis, S.; Mahieu, S.; Snyders, R.; Depla, D.
err分享
err收藏
Experimental determination and simulation of the angular distribution of the metal flux during magnetron sputter deposition
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2010-02-05
err21
errOAAI
errHorkel, M.; Van Aeken, K.; Eisenmenger-Sittner, C.; Depla, D.; Mahieu, S.; Leroy, W. P.
err分享
err收藏
Noble gas retention in the target during rotating cylindrical magnetron sputtering (vol 93, art no 061501, 2008)
errAPPLIED PHYSICS LETTERS
IF3.6
err2009-02-09
err0
errOAAI
errMahieu, S.; Leroy, W. P.; Depla, D.; Schreiber, S.; Moeller, W.
err分享
err收藏
Noble gas retention in the target during rotating cylindrical magnetron sputtering
errAPPLIED PHYSICS LETTERS
IF3.6
err2008-08-12
err15
PREAI
errMahieu, S.; Leroy, W. P.; Depla, D.; Schreiber, S.; Moeller, W.
err分享
err收藏
Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering
errJOURNAL OF PHYSICS D-APPLIED PHYSICS
IF3.2
err2008-01-11
err17
PREAI
errLi, X. Y.; Depla, D.; Leroy, W. P.; Haemers, J.; De Gryse, R.
err分享
err收藏

研究方向

暂时未获取到该数据
合作学者
合作期刊
韩杰才 封面图
韩杰才 (Jiecai Han)
H 指数: 64 · 论文数: 413
J
Johan Verbeeck
H 指数: 61 · 论文数: 520
W
W. Möller
H 指数: 54 · 论文数: 476
朱
朱嘉琦 (Jiaqi Zhu)
H 指数: 48 · 论文数: 625
R
Rony Snyders
H 指数: 47 · 论文数: 339
查看更多